Preparation of Pb(Zr,Ti)O_3 Thin Films by Multi-Target Sputtering

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1993-09-30

著者

• Hirata K

  Kyushu Inst. Technology Kitakyushu

• Hirata Kazuo

  Anelva Co.ltd.

• HOSOKAWA Naokichi

  ANELVA CORPORATION

• SAKUMA Toshiyuki

  Fundamental Research Laboratories, NEC Corporation

• MIYASAKA Yoichi

  Fundamental Research Laboratories, NEC Corporation

• HASE Takashi

  Fundamental Research Laboratories, NEC Corporation

• Sakuma T

  Fundamental Research Laboratories Nec Corporation

• Sakuma Toshiyuki

  Fundamental Research Laboratories Nec Corporation

• Hase T

  Nec Corp. Kawasaki Jpn

• Hase Takashi

  Fundamental Research Laboratories Nec Corporation

• Hosokawa N

  Anelva Corp. Tokyo Jpn

• Miyasaka Y

  Fundamental Research Laboratories Nec Corporation

• Miyasaka Yoichi

  Fundamental Research Laboratories Nec Corporation

関連論文

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• Filling of Sub-μm Through-holes by Self-sputter Deposition
• Effect of Reducing Process Temperature for Preparing SrBi_2Ta_20_9 in a Metal/Ferroelectric/ Semiconductor Structure
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• Relationship between Energetic Neutrals and Impurities in Sputtered Films
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• High Dielectric Constant (Ba, Sr)TiO_3 Thin Films for ULSI DRAM Application
• Downstream Gas Temperature Variation of Glow and Plasmoidal Oxygen Radio Frequency Discharges
• Imprint Characteristics of SrBi2Ta2O9 Thin Films with Modified Sr Composition

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