Preparation of Pb(Zr, Ti)O_3 Thin Films by Multitarget Sputtering (<Special Issue> FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-09-30
著者
-
Hirata K
Kyushu Inst. Technology Kitakyushu
-
Hirata Kazuo
Anelva Co.ltd.
-
HOSOKAWA Naokichi
ANELVA CORPORATION
-
MIYASAKA Yoichi
Fundamental Research Laboratories, NEC Corporation
-
Amanuma K
Silicon Systems Research Laboratories Nec Corporation
-
HASE Takashi
Fundamental Research Laboratories, NEC Corporation
-
AMANUMA Kazushi
Fundamental Research Laboratories, NEC Corporation
-
Hase T
Nec Corp. Kawasaki Jpn
-
Hase Takashi
Fundamental Research Laboratories Nec Corporation
-
Hosokawa N
Anelva Corp. Tokyo Jpn
-
Miyasaka Y
Fundamental Research Laboratories Nec Corporation
-
Miyasaka Yoichi
Fundamental Research Laboratories Nec Corporation
関連論文
- Preparation of YBa_2Cu_3O_y Superconducting Thin Films by Radio-Frequency Plasma Flash Evaporation
- Gas-Temperature-Controlled (GTC) CVD of Aluminum and Aluminum-Silicon Alloy Film for VLSI Processing : Techniques, Instrumentations and Measurement
- Epitaxial Growth of Al on Si by Gas-Temperature-Controlled Chemical Vapor Deposition : Techniques, Instrumentations and Measurement
- Structural and Electrical Characterization of SrTiO_3 Thin Films Prepared by Metal Organic Chemical Vapor Deposition
- Sputter Synthesis of Ba_2YCu_3O_y As-Deposited Superconducting Thin Films from Stoichiometric Target---A Mechanism of Compositional Deviation and Its Control : Electrical Properties of Condensed Matter
- Study of Submicron SrTiO_3 Patterning
- Filling of Sub-μm Through-holes by Self-sputter Deposition
- Characteristics of 0.25 μm Ferroelectric Nonvolatile Memory with a Pb(Zr, Ti)O_3 Capacitor on a Metal/Via-Stacked Plug
- 0.25μm FeRAM with CMVP (Capacitor-on-Metal/Via-Stacked-Plug) Memory Cell
- Effect of Reducing Process Temperature for Preparing SrBi_2Ta_20_9 in a Metal/Ferroelectric/ Semiconductor Structure
- Preparation of Pb(Zr, Ti)O_3 Thin Films by Multitarget Sputtering ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Preparation of Pb(Zr,Ti)O_3 Thin Films by Multi-Target Sputtering
- Pb(Zr, Ti)O_3 Thin-Film Preparation by Multitarget Magnetron Sputtering
- RuO_2/TiN-Based Storage Electrodes for (Ba, Sr)TiO_3 Dynamic Random Access Memory Capacitors
- SrTiO_3 Thin Film Preparation by Ion Beam Sputtering and Its Dielectric Properties : Thin Films
- High-Vacuum Planar Magnetron Sputtering
- Ba_2Y_1Cu_3O_ Oxidation by Thermodynamic Nonequilibrium High-Temperature (TNH) Plasma
- Remote Plasma SiO_2 Deposition by Tetraethoxysilane with Chemically and Energetically Different Atomic Species
- Superiority of O(^1D) atom for solid and gas phase reactions over O(^3P) atom
- Properties of Atomic Oxygen obtained from Thermodynamically Non-equilibrium High Temperature Plasma
- ZnO/SiO_2/Si Diaphragm Bulk Acoustic Wave Composite Resonators : Ultrasonic Transduction
- Single 1.5V Operation Power Amplifier MMIC with SrTiO_3 Capacitors for 2.4GHz Wireless Applications(Special Issue on Microwave and Millimeter-Wave Module Technology)
- SrTiO_3 Capacitor with Relative Dielectric Constant of 200 on GaAs Substrate at Microwave Frequency
- Ferroelectric Pb(Zr, Ti)O_3 Thin Films Prepared by Metal Target Sputtering : T: Thin Film
- Fatigue Characteristics of Sol-Gel Derived Pb(Zr, Ti)O_3 Thin Films ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Ferroelectric Properties of Sol-Get Derived Pb(Zr,Ti)O_3 Thin Films
- Relationship between Energetic Neutrals and Impurities in Sputtered Films
- Reactive Coevaporation Synthesis and Characterization of SrTiO_3 Thin Films : Thin Films
- Analysis of the Dependence of Ferroelectric Properties of Strontium Bismuth Tantalate (SBT) Thin Films on the Composition and Process Temperature
- High Dielectric Constant (Ba, Sr)TiO_3 Thin Films for ULSI DRAM Application
- Downstream Gas Temperature Variation of Glow and Plasmoidal Oxygen Radio Frequency Discharges
- Imprint Characteristics of SrBi2Ta2O9 Thin Films with Modified Sr Composition