Hase Takashi | Fundamental Research Laboratories Nec Corporation
スポンサーリンク
概要
関連著者
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Hase Takashi
Fundamental Research Laboratories Nec Corporation
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Miyasaka Yoichi
Fundamental Research Laboratories Nec Corporation
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MIYASAKA Yoichi
Fundamental Research Laboratories, NEC Corporation
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HASE Takashi
Fundamental Research Laboratories, NEC Corporation
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Hase T
Nec Corp. Kawasaki Jpn
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Miyasaka Y
Fundamental Research Laboratories Nec Corporation
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Hirata K
Kyushu Inst. Technology Kitakyushu
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Hirata Kazuo
Anelva Co.ltd.
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HOSOKAWA Naokichi
ANELVA CORPORATION
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SAKUMA Toshiyuki
Fundamental Research Laboratories, NEC Corporation
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Amanuma K
Silicon Systems Research Laboratories Nec Corporation
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AMANUMA Kazushi
Fundamental Research Laboratories, NEC Corporation
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Sakuma T
Fundamental Research Laboratories Nec Corporation
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Sakuma Toshiyuki
Fundamental Research Laboratories Nec Corporation
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Hosokawa N
Anelva Corp. Tokyo Jpn
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NOGUCHI Takehiro
Fundamental Research Laboratories, NEC Corporation
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Koike H
Nec Corp. Kanagawa Jpn
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Kishi H
General R&d Laboratories Taiyo Yuden Co. Ltd.
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Kishi Hiroshi
Taiyo Yuden Co. Ltd.
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Hirai T
Tohoku Univ. Sendai‐shi
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Hirai Toshihiro
Material Development Research Laboratory Nippon Mining Co. Lid.
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Kishi Hiroshi
General R&d Laboratories Toiyo Yuden Co. Ltd.
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Kishi Hiroshi
The School Of Science And Engineering Waseda University
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Hirai Tadahiko
The School of Science and Engineering, Waseda University
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Tarui Yasuo
The School of Science and Engineering, Waseda University
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Tarui Y
National Institute Of Advanced Industrial Science And Technology
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Ochi A
Nec Corp. Kawasaki Jpn
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Ochi Atsushi
Fundamental Res. Labs.
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Hirai T
Canon Inc. Tokyo Jpn
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TARUI Yasuo
National Institute of Advanced Industrial science and Technology
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NAGASHIMA Kazuhito
The School of Science and Engineering, Waseda University
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KOIKE Hiroshi
The School of Science and Engineering, Waseda University
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FUJISAKI Yoshihide
The School of Science and Engineering, Waseda University
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MORI Toru
Fundamental Research Laboratories, NEC Corporation
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Takemura Koichi
Fundamental Research Laboratories Nec Corporation
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Nagashima K
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Fujisaki Y
R&d Association For Future Electron Devices
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Mori Toru
Fundamental Research Laboratories Nec Corporation
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Tarui Yasuo
The School Of Science And Engineering Waseda University
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Fujisaki Yoshihisa
R&D Association for Future Electron Devices
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Hase Takashi
Fundamental Research Laboratories, NEC Corporation, 4-1-1 Miyazaki, Miyamae-ku, Kawasaki 216-8555, Japan
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Miyasaka Yoichi
Fundamental Research Laboratories, NEC Corporation, 4-1-1 Miyazaki, Miyamae-ku, Kawasaki 216-8555, Japan
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Noguchi Takehiro
Fundamental Research Laboratories, NEC Corporation, 4-1-1 Miyazaki, Miyamae-ku, Kawasaki 216-8555, Japan
著作論文
- Effect of Reducing Process Temperature for Preparing SrBi_2Ta_20_9 in a Metal/Ferroelectric/ Semiconductor Structure
- Preparation of Pb(Zr, Ti)O_3 Thin Films by Multitarget Sputtering ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Preparation of Pb(Zr,Ti)O_3 Thin Films by Multi-Target Sputtering
- Pb(Zr, Ti)O_3 Thin-Film Preparation by Multitarget Magnetron Sputtering
- Fatigue Characteristics of Sol-Gel Derived Pb(Zr, Ti)O_3 Thin Films ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Ferroelectric Properties of Sol-Get Derived Pb(Zr,Ti)O_3 Thin Films
- Analysis of the Dependence of Ferroelectric Properties of Strontium Bismuth Tantalate (SBT) Thin Films on the Composition and Process Temperature
- Imprint Characteristics of SrBi2Ta2O9 Thin Films with Modified Sr Composition