Hosokawa N | Anelva Corp. Tokyo Jpn
スポンサーリンク
概要
関連著者
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HOSOKAWA Naokichi
ANELVA CORPORATION
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Hosokawa N
Anelva Corp. Tokyo Jpn
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Wickramanayaka Sunil
静岡大 電子工研
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Wickramanayaka S
Anelva Corporation
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Hirata K
Kyushu Inst. Technology Kitakyushu
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Hirata Kazuo
Anelva Co.ltd.
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Hatanaka Y
Research Institute Of Electronics
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Hatanaka Y
Research Institute Of Electronics Shizuoka University
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Hatanaka Yoshinori
Research Institute Of Electronics Shizuoka University:graduate School Of Electric Science And Techno
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MIYASAKA Yoichi
Fundamental Research Laboratories, NEC Corporation
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Sunil Wickramanayaka
静岡大学電子工学研究所
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ASAMAKI Tatsuo
Department of Electrical Engineering, Science University of Tokyo
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Asamaki T
Tokyo Univ. Sci. Tokyo Jpn
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HASE Takashi
Fundamental Research Laboratories, NEC Corporation
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Hase T
Nec Corp. Kawasaki Jpn
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Hase Takashi
Fundamental Research Laboratories Nec Corporation
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Wickramanayaka Sunil
Anelva Corporation Head Office
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Miyasaka Y
Fundamental Research Laboratories Nec Corporation
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Miyasaka Yoichi
Fundamental Research Laboratories Nec Corporation
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Hatanaka Y
Graduate School Of Electronic Science And Technology Shizuoka University
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Kobayashi Tsukasa
Anelva Corporation
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Hatanaka Y
Shizuoka Univ. Hamamatsu Jpn
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SEKIGUCHI Atsushi
ANELVA Corporation
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ASAMAKI Tatsuo
ANELVA Corporation
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SAKUMA Toshiyuki
Fundamental Research Laboratories, NEC Corporation
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Sakuma T
Fundamental Research Laboratories Nec Corporation
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Sakuma Toshiyuki
Fundamental Research Laboratories Nec Corporation
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Sekiguchi A
Anelva Corp. Tokyo Jpn
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Sekiguchi Atsushi
ANELVA CORP., Yotsuya 5-8-1, Fuchu 183-8508, Japan
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Ishibashi K
Sumitomo Electric Ind. Ltd. Hyogo Jpn
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NAKANISHI Yoichiro
Research Institute of Electronics, Shizuoka University
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NAKANISHI Yoichiro
Graduate School of Electronic Science and Technology, Shizuoka University
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Nakamura Gen
Department Of Mathematics Josai University
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Nakamura Gen
Department Of Electrical Engineering Science University Of Tokyo
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Nakanishi Yoichiro
Research Institute Of Electronics Graduate School Of Electronic Science And Technology Shizuoka Univ
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Nakanishi Yoichiro
Graduate School Of Electronic Science And Technology Shizuoka University
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Hatanaka Yoshinori
Research Institute Of Electronics Graduate School Of Electronic Science And Technology Shizuoka Univ
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MIURA Tatsuro
Department of Applied Physics, Graduate School of Engineering, Tohoku University
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MATSUMOTO Akihiro
Osaka Municipal Technical Research Institute
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Matsumoto Akinori
Research Institute Of Electronics Shizuoka University
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MIURA Tsutomu
Department of Electrical Engineering, Science University of Tokyo
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Hotate Kohichi
Department Of Electrical Engineering Science University Of Tokyo
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Miura T
Department Of Electrical & Electronic Engineering Yamaguchi University
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Asamaki Tatsuo
Department Of Electrical Engineering Science University Of Tokyo
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Amanuma K
Silicon Systems Research Laboratories Nec Corporation
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AMANUMA Kazushi
Fundamental Research Laboratories, NEC Corporation
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YONAIYAMA Shingo
Department of Electrical Engineering, Science University of Tokyo
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ISHIBASHI Keiji
ANELVA Corporation
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Wickramanayaka Sunil
Research Institute of Electronics, Shizuoka University
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Wickramanayaka Sunil
Graduate School of Electronic Science and Technology, Shizuoka University
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Fuji Masayuki
Graduate School of Electronic Science and Technology, Shizuoka University
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Miura Tsutomu
Department Of Electrical Engineeing Faculty Of Engineering Science University Of Tokyo
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Fuji Masayuki
Graduate School Of Electronic Science And Technology Shizuoka University
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Yonaiyama Shingo
Department Of Electrical Engineering Science University Of Tokyo
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Miura Tsutomu
Department Of Applied Bioscience Tokyo University Of Agriculture
著作論文
- Gas-Temperature-Controlled (GTC) CVD of Aluminum and Aluminum-Silicon Alloy Film for VLSI Processing : Techniques, Instrumentations and Measurement
- Epitaxial Growth of Al on Si by Gas-Temperature-Controlled Chemical Vapor Deposition : Techniques, Instrumentations and Measurement
- Preparation of Pb(Zr, Ti)O_3 Thin Films by Multitarget Sputtering ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Preparation of Pb(Zr,Ti)O_3 Thin Films by Multi-Target Sputtering
- Pb(Zr, Ti)O_3 Thin-Film Preparation by Multitarget Magnetron Sputtering
- High-Vacuum Planar Magnetron Sputtering
- Remote Plasma SiO_2 Deposition by Tetraethoxysilane with Chemically and Energetically Different Atomic Species
- Superiority of O(^1D) atom for solid and gas phase reactions over O(^3P) atom
- Properties of Atomic Oxygen obtained from Thermodynamically Non-equilibrium High Temperature Plasma