Miura T | Department Of Electrical & Electronic Engineering Yamaguchi University
スポンサーリンク
概要
関連著者
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MIURA Tatsuro
Department of Applied Physics, Graduate School of Engineering, Tohoku University
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Miura T
Department Of Electrical & Electronic Engineering Yamaguchi University
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Terashima Yoshiaki
Advanced Research Laboratory Toshiba Research And Development Center
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Terashima Yoshiaki
The Authors Are With Toshiba
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Terashima Y
Toshiba Research And Development Center Kawasaki
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TERASHIMA Yoshiaki
Toshiba Research and Development Center
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MIURA Tadao
Toshiba Research and Development Center
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Miura Tadao
Toshiba Corporation
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Sagoi M
Toshiba Corp. Kawasaki Jpn
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Kubo K
Research And Development Center Toshiba Corporation
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Takuma H
Univ. Electro‐communications Tokyo Jpn
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Takuma Hiroshi
Institute For Laser Science University Of Electro-communications
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Takuma H
Japan Atomic Energy Res. Inst. Kyoto
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SHIMAUCHI Midori
Institute for Laser Science, University of Electro-Communications
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MIURA Tokiwa
School of Science and Technology, Meiji University
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YOSHIDA Jiro
Healthcare Institute, Wakunaga Pharmaceutical Co., Ltd.
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Mizushima Koichi
Advanced Research Laboratory Toshiba R&d Center
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KUBO Kohji
Department of Applied Physics, School of Science and Engineering, Waseda University
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Kubo K
Univ. Tsukuba Ibaraki Jpn
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Yoshida J
Furukawa Electric Co. Ltd. Yokohama Jpn
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Yoshida J
Healthcare Institute Wakunaga Pharmaceutical Co. Ltd.
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Yoshida Jiro
Healthcare Institute Wakunaga Pharmaceutical Co. Ltd.
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Mizushima K
Toshiba Corp. Kawasaki Jpn
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MIURA Tadao
Advanced Reseach Laboratory, Toshiba Reseach and Development, Center
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Takuma Hiroshi
Institute For Laser Science The University Of Electro-communications
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SUMIYA Touru
Tanaka Solid Junction Project, Japan Science and Technology Corporation
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MIURA Tadao
Tanaka Solid Junction Project, Japan Science and Technology Corporation
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TANAKA Shun-ichiro
Tanaka Solid Junction Project, Japan Science and Technology Corporation
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Tanaka Shun-ichiro
Tanaka Solid Junction Project Erato Japan Science And Technology Corporation
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Sumiya Touru
Tanaka Solid Junction Project Japan Science And Technology Corporation
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Tanaka Shun-ichiro
Tanaka Solid Junction Project, ERATO, Japan Science and Research Corporation
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SAGOI Masayuki
Toshiba Research and Development Center
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Sato Ryuji
Department Of Chemistry Nagaoka University Of Technology
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Sato R
Waseda Univ. Tokyo
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Sato R
Toshiba Corp. Kawasaki Jpn
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Mizutani Y
Shinko Electric Wire Co. Ltd.
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SAGOI Masayuki
Advanced Research Laboratory, Toshiba R&D Center
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Takeno S
Toshiba Corp. Yokohama Jpn
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Ishizuka Yoshiki
Toshiba Research & Development Center, Toshiba Corporation
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FUJINUMA Haruko
Tanaka Solid Junction Project, Japan Science and Technology Corporation
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Mizutani Y
The Author Is With Display Materials And Devices Research Laboratory Corporate Research And Developm
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Fujinuma H
Tanaka Solid Junction Project Japan Science And Technology Corporation
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Sato Rumiko
Department Of Electronic Engineering Mining College Akita University
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Ishizuka Yoshiki
Toshiba Research & Development Center Toshiba Corporation
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SAGOI Masayuki
Advanced Research Laboratory, Toshiba R&D Center
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KUBO Kohichi
Toshiba Research and Development Center
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MIZUTANI Yoshihisa
Toshiba Research and Development Center
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YOSHIDA Jiro
Toshiba Research and Development Center
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MIZUSHIMA Kohichi
Toshiba Research and Development Center
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SAGOI Masayuki
Research and Development Center, Toshiba Corporation
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TERASHIMA Yoshiaki
Research and Development Center, Toshiba Corporation
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KUBO Koh-ichi
Research and Development Center, Toshiba Corporation
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MIZUTANI Yoshihisa
Research and Development Center, Toshiba Corporation
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MIURA Tadao
Research and Development Center, Toshiba Corporation
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YOSHIDA Jiro
Research and Development Center, Toshiba Corporation
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MIZUSHIMA Koh-ichi
Research and Development Center, Toshiba Corporation
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KUBO Koichi
Toshiba Research and Development Center
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Ishibashi K
Sumitomo Electric Ind. Ltd. Hyogo Jpn
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Nakamura Gen
Department Of Mathematics Josai University
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Nakamura Gen
Department Of Electrical Engineering Science University Of Tokyo
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HOSOKAWA Naokichi
ANELVA CORPORATION
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XING Da
Institute for Laser Science, University of Electro-Communications
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TAKENO Shiro
TOSHIBA CORPORATION Research and Development Center
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NAKAMURA Shin-ichi
TOSHIBA CORPORATION Research and Development Center
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Kubo Koh-ichi
Research And Development Center Toshiba Corporation
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Mizushima Koichi
Advanced Research Laboratory Toshiba Corporation
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Terashima Yoshiaki
Advanced Research Laboratory R & D Center Toshiba Corporation
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Xing Da
Institute For Laser Science University For Electron-communications
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Xing Da
Institute For Laser Science University Of Electro-communications:(present Address) Laser Life Scienc
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ASAMAKI Tatsuo
Department of Electrical Engineering, Science University of Tokyo
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MIURA Tsutomu
Department of Electrical Engineering, Science University of Tokyo
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Hotate Kohichi
Department Of Electrical Engineering Science University Of Tokyo
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YOSHIDA Jiro
Advanced Research Laboratory, Toshiba R&D Center
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Yoshida Jiro
Advanced Materials And Devices Laboratory Research And Development Center Toshiba Corporation
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Asamaki T
Tokyo Univ. Sci. Tokyo Jpn
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Asamaki Tatsuo
Department Of Electrical Engineering Science University Of Tokyo
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Nakamura Shin-ichi
Toshiba Research And Development Center
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SATO Rie
Advanced Research Laboratory, Research and Development Center, Toshiba Corporation
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TAKENO Shiro
Materials Application Dept. Environmental Engineering Lab. Research and Development Center, Toshiba
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SATO Rie
Toshiba Research and Development Center
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YONAIYAMA Shingo
Department of Electrical Engineering, Science University of Tokyo
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ISHIBASHI Keiji
ANELVA Corporation
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Miura Tsutomu
Department Of Electrical Engineeing Faculty Of Engineering Science University Of Tokyo
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Yonaiyama Shingo
Department Of Electrical Engineering Science University Of Tokyo
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Hosokawa N
Anelva Corp. Tokyo Jpn
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Miura Tsutomu
Department Of Applied Bioscience Tokyo University Of Agriculture
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Takeno Shiro
Toshiba Corp., 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
著作論文
- Effects of Oxygen Partial Pressure and Substrate Temperature on Crystalline Orientation in Y-Ba-Cu-O Films Prepared by Sputtering
- Structural Features and Superconducting Properties of As-Grown Y-Ba-Cu-O Films
- Low Temperature Preparation of As-Sputtered Superconducting YBaCuO Thin Films by Magnetron Sputtering : Electrical Properties of Condensed Matter
- Absorption Lines of O_2 and HF in KrF Laser Spectrum
- Determination of Molecular Constnts of the X^3Σ^-_g State of O_2
- Absorption Lines of Vibrationally Excited O_2 and HF in ArF Laser Spectrum
- Effects of Substrates on Formation of Metastable Bi_2Sr_Cu_nO_y Thin Films
- Electric Properties of the Y-Ba-Cu-O/Ag Interface : Electrical Properties Condensed Matter
- Preparation of Epitaxial SrCuO_x Thin Films with an Infinite-Layer Structure
- Crystalline Orientation Control for Bi-Sr-Ca-Cu-O Thin Films Prepared on (110)SrTiO_3 by Coevaporation
- Preparation of Ca-Substituted Y-Ba-Cu-O "124" Phase Thin Films by Magnetron Sputtering and Their Thermal Stability
- Phase Control of Bi-Sr-Ca-Cu-O Thin Films Prepared by Coevaporation with RF Oxygen Plasma
- High-Vacuum Planar Magnetron Sputtering
- Ballistic Electron Emission Microscopy Studies of Inhomogeneity in Au/CaF_2/n-Si(111) Interfaces
- Scanning Tunneling Microscopy Study of Initial Growth of CaF_2 and BaF_2 on Si(111)
- Nucleation and Growth Morphology in Heteroepitaxy of CaF_2 on Si(111) : a Study with Scanning Tunneling Microscopy