Effects of Oxygen Partial Pressure and Substrate Temperature on Crystalline Orientation in Y-Ba-Cu-O Films Prepared by Sputtering
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1989-04-20
著者
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Kubo K
Research And Development Center Toshiba Corporation
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TERASHIMA Yoshiaki
Toshiba Research and Development Center
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SAGOI Masayuki
Toshiba Research and Development Center
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KUBO Kohichi
Toshiba Research and Development Center
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MIZUTANI Yoshihisa
Toshiba Research and Development Center
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MIURA Tadao
Toshiba Research and Development Center
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YOSHIDA Jiro
Toshiba Research and Development Center
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MIZUSHIMA Kohichi
Toshiba Research and Development Center
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MIURA Tatsuro
Department of Applied Physics, Graduate School of Engineering, Tohoku University
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YOSHIDA Jiro
Healthcare Institute, Wakunaga Pharmaceutical Co., Ltd.
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Mizushima Koichi
Advanced Research Laboratory Toshiba R&d Center
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Terashima Yoshiaki
Advanced Research Laboratory Toshiba Research And Development Center
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Terashima Yoshiaki
The Authors Are With Toshiba
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KUBO Kohji
Department of Applied Physics, School of Science and Engineering, Waseda University
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Kubo K
Univ. Tsukuba Ibaraki Jpn
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Mizutani Y
Shinko Electric Wire Co. Ltd.
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Miura T
Department Of Electrical & Electronic Engineering Yamaguchi University
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Miura Tadao
Toshiba Corporation
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Yoshida J
Furukawa Electric Co. Ltd. Yokohama Jpn
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Yoshida J
Healthcare Institute Wakunaga Pharmaceutical Co. Ltd.
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Yoshida Jiro
Healthcare Institute Wakunaga Pharmaceutical Co. Ltd.
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Sagoi M
Toshiba Corp. Kawasaki Jpn
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Terashima Y
Toshiba Research And Development Center Kawasaki
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Mizushima K
Toshiba Corp. Kawasaki Jpn
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Mizutani Y
The Author Is With Display Materials And Devices Research Laboratory Corporate Research And Developm
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