Characteristics of Low-Temperature-Processed a-Si TFT for Plastic Substrates(Special Issue on Electronic Displays)
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概要
- 論文の詳細を見る
The a-Si TFT characteristics were studied for process temperatures of as low as 100℃. The a-Si TFT kept normal characteristics for process temperature of as low as 150℃. The a-Si TFT bias temperature stability was evaluated and degradation of stability initiated at around 150℃. The characteristics of a-Si TFT fabricated on plastic substrates were the same as those of a-Si TFT fabricated on glass substrates at low process temperature. TFT-LCD fabricated at a process temperature lower than the glass transition temperature of plastic substrates indicated good display image. These results indicate the possibility of fabricating TFT-LCD on plastic substrates, which would promote the application of a-Si TFT-LCD for mobile devices.
- 社団法人電子情報通信学会の論文
- 2000-10-25
著者
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Ashida Sumio
The Author Is With Display Materials And Devices Research Laboratory Corporate Research And Developm
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Yamada Keisaku
The Author Is With Display Materials And Devices Research Laboratory Corporate Research And Developm
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Ikeda Mitsushi
The Author Is With Display Materials And Devices Research Laboratory Corporate Research And Developm
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MIZUTANI Yoshihisa
The author is with Display Materials and Devices Research laboratory, Corporate Research and Develop
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Mizutani Y
The Author Is With Display Materials And Devices Research Laboratory Corporate Research And Developm
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- Characteristics of Low-Temperature-Processed a-Si TFT for Plastic Substrates(Special Issue on Electronic Displays)