Plasma CVD of Amorphous AlN from Metalorganic Al Source and Properties of the Deposited Films

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概要

• 論文の詳細を見る

• AlN films have been successfully deposited by plasma CVD for the first time. Al was supplied by trimethyl Al (TMA) with H_2 or N_2 carrier gas, and N was supplied as NH_3 through separate gas lines. The deposition rate depends upon the TMA supply, and is essentially independent of the NH_3 flow rate. The composition of the deposited films was almost AlN, although a small amount of oxygen was always detected. A better film was obtained for the H_2 carrier gas than for N_2 carrier gas. X-ray diffraction profiles of the deposited films exhibited no crystalline AlN diffracting peaks, suggesting that the films are not crystallized, but the infrared and ultraviolet absorption spectra exhibited the presence of the Al-N bond (650/cm) and an optical band gap of 5.55 eV. The refractive index was about 1.9. These results suggest that the plasma-deposited films possess dominant AlN properties even though they are not crystalline.

• 社団法人応用物理学会の論文
• 1987-09-20

著者

• Kubo K

  Research And Development Center Toshiba Corporation

• HASEGAWA Fumio

  Institute of Applied Physics, University of Tsukuba

• Nannichi Yasuo

  Institute of Materials Science, University of Tsukuba

• Takahashi Teruo

  Department Of Organic And Polymeric Materials Tokyo Institute Of Technology

• Nannichi Yasuo

  University Of Tsukuba

• Nannichi Yasuo

  Institute Of Materials Science Institute Of Applied Physics University Of Tsukuba

• Nannichi Yasuo

  Institute Of Materials Science And Center For Tara Tsukuba Advanced Research Alliance University Of

• Takahashi Tetsuo

  National Institute Of Advanced Industrial Science And Technology Power Electronics Research Center

• Taguchi Tomohiro

  Department Of Organic Materials Tokyo Institute Of Technology

• KUBO Kohji

  Department of Applied Physics, School of Science and Engineering, Waseda University

• HASEGAWA Fumio

  Tohoku University of Art and Design

• Kubo K

  Univ. Tsukuba Ibaraki Jpn

• Hasegawa Fumio

  Institute Of Applied Physics University Of Tsukuba

• Takahashi T

  Japan Advanced Institute Of Science And Technology

• TAKAHASHI Tsuyoshi

  Institute of Materials Science, University of Tsukuba

• KUBO Kiyokazu

  Institute of Materials Science, University of Tsukuba

• HASEGAWA Fumio

  Institlite of Materials Science, University of Tsukuba

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