Gas Source MBE Growth of GaAs/AlGaAs Heterojunction Bipolar Transistor with a Carbon Doped Base Using Only Gaseous Sources
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-03-15
著者
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YOKOYAMA Naoki
Fujitsu Laboratories Ltd.
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FUJII Toshio
Fujitsu Laboratories Ltd.
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Yokoyama Naoki
Department of Pediatrics, Kobe University Graduate School of Medicine
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サンドゥー アダルシュ
東工大
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Sandhu A
Fujitsu Laboratories Ltd.
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Sandhu Adarsh
Fujitsu Laboratories Limited
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ANDO Hideyasu
Fujitsu Laboratories Ltd.
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OKAMOTO Naoya
Fujitsu Laboratories Ltd.
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TAKAHASHI Tsuyoshi
Fujitsu Laboratories Ltd.
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ISHIKAWA Hideaki
Fujitsu Laboratories Ltd.
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Fujii Toshio
Fujitsu Laboratories Lid.
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Ishikawa T
Fujitsu Laboratories Ltd.
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Takahashi Teruo
Department Of Organic And Polymeric Materials Tokyo Institute Of Technology
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Takahashi Tetsuo
National Institute Of Advanced Industrial Science And Technology Power Electronics Research Center
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Taguchi Tomohiro
Department Of Organic Materials Tokyo Institute Of Technology
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Ando H
Toshiba Corp. Kawasaki Jpn
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Okamoto N
Fujitsu Lab. Ltd. Atsugi Jpn
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Takahashi T
Japan Advanced Institute Of Science And Technology
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Yokoyama N
Fujitsu Laboratories Ltd.
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