Growth of Epitaxial CeO_2 Films on (1012) Sapphire by Halide Source Plasma Enhanced Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-07-01
著者
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YOKOYAMA Naoki
Fujitsu Laboratories Ltd.
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Tamura H
R&d Center Kasado Administrative Division Power & Industrial Systems Hitachi Ltd.
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NAKAO Hiroshi
Fujitsu Laboratories Ltd.
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Yokoyama Naoki
Department of Pediatrics, Kobe University Graduate School of Medicine
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TAMURA Hirotaka
Fujitsu Laboratory Ltd.
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YOSHIDA Chikako
Fujitsu Laboratories Ltd.
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TAKAUCHI Hideki
Fujitsu Ltd.
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Yokoyama N
Fujitsu Laboratories Ltd.
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YAMAWAKI Hideki
Fujitsu Laboratories Ltd.
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Tamura Hitoshi
Mechanical Engineering Research Laboratory Hitachi Ltd.
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Tamura Hirotaka
Fujitsu Laboratories Ltd.
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Tamura Hideki
Faculty Of Eng. Yamagata Univ.
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Takauchi Hideki
Fujitsu Laboratories Ltd.
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Yokoyama Naoki
Institute For Nano Quantum Information Electronics The University Of Tokyo
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Nakao Hiroshi
Fujitsu Laboratories Lid.
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YAMAWAKI Hideki
Fujitsu Laboratories Lid.
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