Suppression of Beryllium Diffusion by Incorporating Indium in AlGaAs for HBT Applications using Molecular Beam Epitaxy
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1990-05-20
著者
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KATAOKA Yuji
Fujitsu Laboratories Ltd.
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ENDOH Akira
Fujitsu Laboratories Ltd.
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Kataoka Y
Toshiba Corp. Yokohama Jpn
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FUJII Toshio
Fujitsu Laboratories Ltd.
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SASA Shigehiko
Fujitsu Laboratories Ltd.
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ISHIKAWA Hideaki
Fujitsu Laboratories Ltd.
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Fujii Toshio
Fujitsu Laboratories Lid.
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Ishikawa T
Fujitsu Laboratories Ltd.
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TOMIOKA Takeshi
Fujitsu Laboratories Ltd.
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BAMBA Yasuo
Fujitsu Laboratories Ltd.
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ISHII Kazuaki
Fujitsu Laboratories Ltd.
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Bamba Y
Fujitsu Laboratories Ltd.
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Bamba Yasuo
Fujitsu Laboratories Limited
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