Thermal Budget for Fabricating A Dual Gate Deep-Submicron CMOS with Thin Pure Gate Oxide

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概要

• 論文の詳細を見る
• 1995-08-21

著者

• KATAOKA Yuji

  Fujitsu Laboratories Ltd.

• Suzuki K

  School Of Science And Engineering Waseda University:kagami Memorial Laboratory For Materials Science

• Kataoka Y

  Toshiba Corp. Yokohama Jpn

• SUZUKI Kunihiro

  Fujitsu Laboratories Ltd.

• AOYAMA Takahiro

  Daihen Co.

• Suzuki K

  Ntt Transmission Systems Laboratories Lightwave Communications Laboratory

• Aoyama T

  Hitachi Ltd. Ibaraki Jpn

• AOYAMA Takayuki

  Fujitsu Laboratories Lid.

• Suzuki K

  Assoc. Super‐advanced Electronics Technol. Kanagawa Jpn

• TADA Yoko

  Fujitsu Laboratories Ltd.

• SATOH Akira

  FUJITSU LABORATORIES LTD.

• SUGII Toshihiro

  FUJITSU LABORATORIES LTD.

• NAMURA Itaru

  Fujitsu Laboratories Ltd.

• INOUE Fumihiko

  Fujitsu Laboratories Ltd.

• Suzuki K

  Department Of Information And Communication Technology Tokai University

• Tada Y

  Fujitsu Laboratories Ltd.

• Suzuki Kunihiro

  Fujitsu Laboratories Limited., 10-1 Morinosato-Wakamiya, Atsugi 243-0197, Japan

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