Boron Diffusion in SiO_2 Involving High-Concentration Effects
スポンサーリンク
概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2001-04-01
著者
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AOYAMA Takahiro
Daihen Co.
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Aoyama T
Hitachi Ltd. Ibaraki Jpn
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AOYAMA Takayuki
Fujitsu Laboratories Lid.
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ARIMOTO Hiroshi
Fujitsu Laboratories Ltd.
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HORIUCHI Kei
Fujitsu Laboratories Ltd.
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Horiuchi K
Fujitsu Laboratories Ltd.
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Horiuchi Kei
Fujitsu Laboratories
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Arimoto H
Semiconductor Leading Edge Technologies Inc.
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Arimoto Hiroshi
Fujitsu Laboratories Limited
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