TEM Observations of Initial Crystallization States for LPCVD Si Films : Condensed Matter
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概要
- 論文の詳細を見る
Crystallization of LPCVD amorphous silicon films, especially the initial crystallization states, has been studied by transmission electron microscopy (TEM), X-ray diffraction and electron spin resonance (ESR) techniques. For longer annealing times at 600℃, the X-ray diffracted intensity (crystalline component) increased and the electron spin density (mainly amorphous component) decreased; TEM cross-sectional observations indicated that crystallization was initiated only at the film-substrate interface, as reported previously, on the basis of Raman scattering measurements.
- 社団法人応用物理学会の論文
- 1988-10-20
著者
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Suzuki T
Free Electron Laser Research Institute Inc.
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Suzuki T
Nhk (japan Broadcasting Corp.) Tokyo
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Aoyama T
Toshiba Corp. Yokohama Jpn
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Suzuki Tatsuro
Department Of Electrical Engineering Shizuoka University
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AOYAMA Takahiro
Daihen Co.
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Aoyama Tomonori
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Aoyama T
Hitachi Ltd. Ibaraki Jpn
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AOYAMA Takashi
Hitachi Research Laboratory, Hitachi Ltd.
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Miyata K
Institute For Drug Discovery Research Yamanouchi Pharmaceutical Co.
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Suzuki Takaya
Hitachi Limited Hitachi Research Laboratory
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Konishi N
Tohoku Univ. Sendai Jpn
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Konishi Nobutake
Hitachi Research Laboratory Hitachi Ltd.
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Miyata K
Hitachi Research Laboratory Hitachi Ltd.
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Suzuki T
Tdk Corp. Chiba Jpn
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Miyata Kenji
Hitachi Research Laboratory, Hitachi, Ltd.
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ADACHI Eimi
Hitachi Research laboratory, Hitachi Ltd.
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OKAJIMA Yoshiaki
Hitachi Research laboratory, Hitachi Ltd.
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Adachi Eimi
Hitachi Research Laboratory Hitachi Ltd.
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Miyata Kenji
Hitachi Ltd.
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Okajima Yoshiaki
Hitachi Research Lab. Hitachi Lid.
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Okajima Yoshiaki
Hitachi Research Laboratory Hitachi Ltd.
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Aoyama Takashi
Hitachi Research Laboratory Hitachi Ltd
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KONISHI Nobutake
Hitachi Research Laboratory
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