Chemical Vapor Deposition of Ru and Its Application in (Ba, Sr)TiO3 Capacitors for Future DRAM
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概要
- 論文の詳細を見る
- 1998-09-07
著者
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Aoyama T
Toshiba Corp. Yokohama Jpn
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Aoyama T
Hitachi Ltc. Ibaraki Jpn
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Aoyama Tomonori
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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KIYOTOSHI Masahiro
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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EGUCHI Kazuhiro
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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YAMAZAKI Soichi
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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Yamazaki S
Toshiba Corp. Yokohama Jpn
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Eguchi K
Tokyo Metropolitan Univ. Tokyo Jpn
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Kiyotoshi Masahiro
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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