Two-Dimensional Boron Analysis in Borophosphosilicate Glass Film Using Transmission Electron Microscope with Imaging Filter
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-12-15
著者
-
Kimoto K
Advanced Electron Microscope Group Advanced Nano- Characterization Center National Institute For Mat
-
Kimoto Koji
Hitachi Research Laboratory Hitachi Ltd.
-
Kimoto Koji
Advanced Electron Microscope Group Advanced Nano- Characterization Center National Institute For Mat
-
Kimoto K
Hitachi Ltd. Ibaraki Jpn
-
Aoyama T
Toshiba Corp. Yokohama Jpn
-
Aoyama T
Hitachi Ltc. Ibaraki Jpn
-
Aoyama Tomonori
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
-
Kimoto K
Hitachi Research Laboratory Hitachi Ltd.
-
Kimoto Koji
National Institute For Materials Science
-
Kimoto Koji
Advance Materials Laboratory National Institute For Materials Science
-
SEKIGUCHI Tomoko
Hitachi Research Laboratory, Hitachi Ltd.
-
AOYAMA Takashi
Hitachi Research Laboratory, Hitachi Ltd.
-
MITSUI Yasuhiro
Semiconductor & Integrated Circuits Division, Hitachi Ltd.
-
Sekiguchi Tomoko
Hitachi Research Laboratory Hitachi Ltd.:(pressent Address)central Research Laboratory Hitachi Ltd.
-
Kimoto Koji
Advanced Materials Laboratory National Institute For Materials Science
-
Kimoto Koji
Hitachi Research Laboratory Hitachi Ltd
-
Mitsui Y
Semiconductor & Integrated Circuits Division Hitachi Ltd.
-
Aoyama Takashi
Hitachi Research Laboratory Hitachi Ltd
-
Kimoto Koji
Advanced Electron Microscope Group, Advanced Nano- Characterization Center, National Institute for Materials Science
関連論文
- Effect of Quenched Disorder on Charge Ordering Structure in RE_AE_NiO_4(RE=La, Pr, Nd, Sm;AE=Ca, Sr)(Condensed matter: electronic structure and electrical, magnetic, and optical properties)
- TEM study of the influence of antisite defects on magnetic domain structures in double perovskite Ba_2FeMoO_6
- Investigation on buffer layer for InN growth by molecular beam epitaxy
- Microstructural Observation of Si_Ge_x Thin Films Prepared by Pulsed Ion-Beam Evaporation
- Ru Electrode Deposited by Sputtering in Ar/O_2 Mixture Ambient
- Interfacial Layers between Si and Ru Films Deposited by Sputtering in Ar/O_2 Mixture Ambient
- HRTEM study of new series of oxycarbonitrate superconductors (Cu,C,N)(n=1-6)
- Light element analysis in oxycarbonate superconductors using EELS
- Nitrogen Distribution and Chemical Bonding State Analyses in Oxynitride Film by Spatially Resolved Electron Energy Loss Spectroscopy (EELS)
- Chemical shift mapping of Si L and K edges using spatially resolved EELS and energy-filtering TEM
- Two-Dimensional Boron Analysis in Borophosphosilicate Glass Film Using Transmission Electron Microscope with Imaging Filter
- Observation of Compositional Separation in CoCrTa Thin Film Using Transmission Electron Microscope with Imaging Filter
- High Spatial Resolution Elemental Mapping of Multilayers Using a Field Emission Transmission Electron Microscope Equipped with an Imaging Filter
- Diffuse Phase Transition and Anisotropic Evolution of Nanodomains in Nd_Sr_MnO_3(Condensed matter : electronic structure and electrical, magnetic, and optical properties)
- Carbon Nanofilm with a New Structure and Property
- Influence of Lattice Distortion and Oxygen Defects in BST Films for Memory Capacitors
- (Ba, Sr)TiO_3 Stacked Capacitor Technology for 0.13μm-DRAMs and Beyond
- Development of dedicated STEM with high stability
- The study of AI-L_23 ELNES with resolution-enhancement software and first-principles calculation
- Spatially-resolved EELS analysis of multilayer using EFTEM and STEM
- Strain Distribution Measurement in Stainless Steels by Convergent-Beam Electron Diffraction
- Quick External Leakage Inspection Method for Gas Supplying System in Semiconductor Facility Using Atmospheric Pressure Ionization Mass Spectrometer
- Yellow Emission from Zinc Oxide giving an Electron Spin Resonance Signal at g=1.96
- Fourier images feature of lattice fringes formed by low-loss electrons as observed using spatially-resolved EELS technique
- Elemental Mapping Using a Field Emission Transmission Electron Microscope with an Imaging Filter
- Modulated Crystal Structure and Spin/Hole Arrangement in the Chain Compound Ca_xCuO_2 (x=0.8240)
- Overdamped NbN Josephson Junctions Based on Nb/AlO_x/Nb Trilayer Technology
- Application of Ion Doping and Excimer Laser Annealing to Fabrication of Low-Temperature Polycrystalline Si Thin-Film Transistors
- Effect of Ion Doping Process on Thin-Film Transistor Characteristics Using a Bucket-Type Ion Source and XeCl Excimer Laser Annealing
- Large-Area Doping for Poly-Si Thin Film Transistors Using Bucket Ion Source with an RF Plasma Cathode
- Quantitative Analysis of Trace Water in Monosilane Gas Using Atmospheric-Pressure Ionization Mass Spectrometer with Bicompartment Ion Source
- Quantitative Analysis of Trace Water in Highly Puified Nitrogen Gas by Atmospheric Pressure Ionization Mass Spectrometer
- A New Atmospheric Pressure Ionization Mass Spectrometer for the Analysis of Trace Gas Impurities in Silicon Source Gases used for Semiconductor Fabrication
- Quantitative Analysis of Trace Hydrogen in Highly Purified Nitrogen Gas Using Rapid Reactions in Atmospheric Pressure Ionization Mass Spectrometer
- A Drift Tube for Monitoring ppb Trace Water
- Time-resolved acquisition technique for spatially-resolved electron energy-loss spectroscopy by energy-filtering TEM
- Time-resolved acquisition technique for elemental mapping by energy-filtering TEM
- Current Status and Future Trend of Analytical Instruments for Failure Analyses in Si Process
- Leakage Current Reduction of Poly-Si Thin Film Transistors by Two-Step Annealing
- Development of a real-time jump-ratio imaging system equipped with a STEM
- Dislocations and Tungsten Concerntration Profiles in Tungsten-Silicon Contact Areas
- TEM Observations of Initial Crystallization States for LPCVD Si Films : Condensed Matter
- Chemical Vapor Deposition of Ru and Its Application in (Ba,Sr) TiO_3 Capacitors for Future Dynamic Random Access Memories
- Chemical Vapor Deposition of Ru and Its Application in (Ba, Sr)TiO3 Capacitors for Future DRAM
- Quantitative Elemental Mapping of Stainless Steel Using an Imaging Filter
- Atomic Species Analysis and Three-Dimensional Observation by High-Angle Hollow-Cone Dark-Field Transmission Electron Microscopy
- Transmission Electron Microscope Sample Shape Optimization for Energy Dispersive X-Ray Spectroscopy Using the Focused Ion Beam Technique
- Measurement of Strain in Locally Oxidized Silicon using Convergent-Beam Electron Diffraction
- Observations of Gold Atomic Clusters in Magnesium Oxide Films under Off-Bragg Conditions
- Elemental mapping and chemical shift analysis using energy-filtering transmission electron microscopy(Abstracts of Doctoral Dissertations,Annual Report (from April 1997 to March 1998))
- Influence of substrate nitridation on GaN and InN growth by plasma-assisted molecular-beam epitaxy