Development of a real-time jump-ratio imaging system equipped with a STEM
スポンサーリンク
概要
- 論文の詳細を見る
- Published for the Japanese Society of Electron Microscopy by Oxford University Pressの論文
- 2001-02-01
著者
-
上田 和浩
日立・日立研
-
上田 和浩
富山大学 理学部
-
ISAKOZAWA Shigeto
Instrument Division, Hitachi Ltd
-
AOYAMA Takashi
Hitachi Research Laboratory, Hitachi Ltd.
-
TAYA Shunroku
Instrument Division, Hitachi Ltd.
-
Taya Shunroku
Instruments Group Hitachi Ltd
-
KAJI Kazutoshi
Hitachi High-Technologies Corp.
-
UEDA Kazuhiro
Hitachi Research Laboratory, Hitachi Ltd
-
TANAKA Hiroyuki
Instruments Group, Hitachi Ltd
-
Kaji Kazutoshi
Hitachi High‐technol. Corp. Ibaraki Jpn
-
Aoyama Takashi
Hitachi Research Laboratory Hitachi Ltd
-
Tanaka Hiroyuki
Instruments Group Hitachi Ltd
-
Isakozawa Shigeto
Hitachi High‐technol. Corp. Ibaraki Jpn
-
Isakozawa Shigeto
Instrument Division Hitachi Ltd
関連論文
- 走査透過像観察装置(HD-2000)による軽元素分布の観察
- 走査透過型電顕(HD-2000)によるスペクトルイメージング
- SiO_xN_y/Si界面の位置分解EELS計測
- X線異常分散を利用したCu/Ni_Fe_積層薄膜の回折線分離法の検討
- 斜入射X線散漫散乱法を用いた凹凸評価における蛍光X線の影響
- 積層フェリ固定層にFe酸化層を挿入したボトムスピンバルブの磁気抵抗効果と自由層の磁気特性(薄膜)
- 31p-ZB-12 結晶傾斜法によるシリコン結晶の結晶完全性と統計的動力学理論による解析
- 27p-L-11 結晶傾斜法によって測定した微小欠陥を含むCzシリコン結晶におけるペンデル振動
- 4a-Z-3 X線高次反射トラバーストボグラフ法によるFZ-Si結晶中の微小欠陥の観察
- Fe酸化層を挿入したスピンバルブにおける自由層の磁気特性
- Co-K_βX線反射率法によるスピンバルブ膜層構造解析の基礎検討
- Co-Kβ X線反射率法によるSV膜層構造解析法に基礎検討
- Development of a real-time defocus-image modulation processing electron microscope. II. Dynamic observation of spherical aberration-free phase image of surface atoms
- Development of a real-time defocus image modulation processing electron microscope. I. Construction
- Nitrogen Distribution and Chemical Bonding State Analyses in Oxynitride Film by Spatially Resolved Electron Energy Loss Spectroscopy (EELS)
- Two-Dimensional Boron Analysis in Borophosphosilicate Glass Film Using Transmission Electron Microscope with Imaging Filter
- シリコン低温エピタキシャル層の評価
- 斜入射X線散漫散乱法による基板表面形状評価
- Cu-K_β-X線反射率法による薄膜積層体の層構造解析 (多層膜・人工格子・グラニューラー)
- CuKβ-X線反射率法による薄膜積層体の層構造解析
- 最小二乗法によるX線反射率解析値の信頼性評価法の検討
- 異常分散利用2波長差分X線反射率のフーリエ変換による積層構造解析法の検討
- 軽元素と中重元素構成の複合材料を同時に可視化--高エネルギー屈折コントラストX線イメージング法による材料観察
- Spatially-resolved EELS analysis of multilayer using EFTEM and STEM
- Development of γ-Type Energy Filtering TEM
- Strain Distribution Measurement in Stainless Steels by Convergent-Beam Electron Diffraction
- Application of Ion Doping and Excimer Laser Annealing to Fabrication of Low-Temperature Polycrystalline Si Thin-Film Transistors
- Effect of Ion Doping Process on Thin-Film Transistor Characteristics Using a Bucket-Type Ion Source and XeCl Excimer Laser Annealing
- Large-Area Doping for Poly-Si Thin Film Transistors Using Bucket Ion Source with an RF Plasma Cathode
- Time-resolved acquisition technique for spatially-resolved electron energy-loss spectroscopy by energy-filtering TEM
- Time-resolved acquisition technique for elemental mapping by energy-filtering TEM
- Current Status and Future Trend of Analytical Instruments for Failure Analyses in Si Process
- The development and characteristics of a high-speed EELS mapping system for a dedicated STEM
- Leakage Current Reduction of Poly-Si Thin Film Transistors by Two-Step Annealing
- Development of a real-time jump-ratio imaging system equipped with a STEM
- Dislocations and Tungsten Concerntration Profiles in Tungsten-Silicon Contact Areas
- TEM Observations of Initial Crystallization States for LPCVD Si Films : Condensed Matter
- Transmission Electron Microscope Sample Shape Optimization for Energy Dispersive X-Ray Spectroscopy Using the Focused Ion Beam Technique