X線異常分散を利用したCu/Ni_<0.8>Fe_<0.2>積層薄膜の回折線分離法の検討

概要

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The induced magneto-elastic energy in a thin magnetic film may result from residual stress combined with magnetostriction, which is sensitive to the crystal structure. Thus, it is important to optimize the magnetostriction in giant magnetoresistive sensor stacks that consist of Co, Cu, and NiFe layers. Analysis of the structure, however, is difficult because the lattice constants of the stacks are similar in each layer. Therefore, a peak separation method for x-ray diffraction (XRD) pattern was examined, using the anomalous dispersion effect. The XRD with the scattering vector in the film plane of a Cu/NiFe multilayer was measured at four x-ray wavelengths: the near Cu-K edge, post Cu-K edge, near Ni-K edge, and post Ni-K edge ones. The in-plane XRD profiles of the sample were slightly different from each other. The differential Cu profile was calculated by simple subtraction of the near Cu-K edge profile from the post Cu-K edge one. The differential NiFe profile was calculated by simple subtraction of the near Ni-K edge profile from the post Ni-K edge one. The Cu and NiFe differential peaks were clearly related to each other. This result suggested that it is possible to analyze the crystal structure in each layer of a Co, Cu, and NiFe multilayer stack by using the anomalous dispersion effect.
社団法人日本磁気学会の論文
2005-08-01