Quantitative Analysis of Trace Hydrogen in Highly Purified Nitrogen Gas Using Rapid Reactions in Atmospheric Pressure Ionization Mass Spectrometer

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概要

• 論文の詳細を見る

• Quantitative analysis of trace hydrogen in highly purified nitrogen gas for the semiconductor fabrication process was investigated using an atmospheric pressure ionization mass spectrometer (APIMS). A previous method wherein the sample gas is directly introduced into the APIMS is not capable of providing high-sensitivity measurements for hydrogen in nitrogen gas. By mixing 20% argon gas with the sample gas, the sensitivity was increased to ten times that of the previous method. This is due to the occurrence of a previously unreported rapid reaction through which the quantity of hydrogen tons is increased: (N_2Ar)^++H_2→N_2H^++H+Ar. The detection limit in this method and the rate constant for this reaction were estimated to be 40 ppt and 1.4×10^<-10> molecule^<-1>cm^3s^<-1>, respectively.

• 社団法人応用物理学会の論文
• 1993-06-15

著者

• Irie T

  Kyoto Univ. Kyoto Jpn

• Saiki A

  Tokyo Inst. Technol. Tokyo Jpn

• Okuhira H

  Central Research Laboratory Hitachi Ltd.

• Okuhira Hidekazu

  Central Research Laboratory Hitachi Ltd.

• MITSUI Yasuhiro

  Central Research Laboratory, Hitachi Ltd.

• IRIE Takashi

  Central Research Laboratory, Hitachi Ltd.

• SAIKI Atsushi

  Industrial Environment Control Facilities Division, Hitachi Plant Engineering & Construction Co., Lt

• Mitsui Y

  Semiconductor & Integrated Circuits Division Hitachi Ltd.

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