Quantitative Analysis of Trace Water in Highly Puified Nitrogen Gas by Atmospheric Pressure Ionization Mass Spectrometer
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概要
- 論文の詳細を見る
Quantitative analysis of trace water, at ppb level and below, in highly purified nitrogen gas used in semiconductor fabrication processes was investigated using an atmospheric pressure ionization mass spectrometer (APIMS). Until recently, the trace analysis of strongly adhesive water was difficult because of the lack of a standard gas for calibration and high background water levels. The standard gas was prepared by using a gas containing a ppm level of water evaporated from a water bottle, and diluting it 10^5 times using a two-step dilution system. To reduce the background, a simplified SUS316L electropolished gas line with no valves, mass flow controllers or connectors was assembled. Using this method, a calibration curve applicable to the low ppm to ppt range was obtained. The background obtained was 40 ppt. The curve was fitted with a theoretical curve calculated from ion-molecule reactions.
- 社団法人応用物理学会の論文
- 1995-09-15
著者
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MITSUI Yasuhiro
Semiconductor & Integrated Circuits Division, Hitachi Ltd.
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Irie T
Kyoto Univ. Kyoto Jpn
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IRIE Takashi
Central Research Laboratory, Hitachi Ltd.
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Mitsui Y
Semiconductor & Integrated Circuits Division Hitachi Ltd.
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MIZOKAMI Kazuaki
EED, Hitachi Tokyo Electronics Co., Ltd.
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KURIYAMA Katsumi
EED, Hitachi Tokyo Electronics Co., Ltd.
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NAKANO Kazuo
EED, Hitachi Tokyo Electronics Co., Ltd.
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NAKAMURA Yuko
EED, Hitachi Tokyo Electronics Co., Ltd.
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KURIYAMA Katsumi
Sales and Marketing Division, Hitachi Tokyo Electronics Co., Ltd.
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Kuriyama Katsumi
Sales And Marketing Division Hitachi Tokyo Electronics Co. Ltd.
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Mizokami Kazuaki
Precision Center Hitachi Tokyo Electronics Co. Ltd.
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Nakano Kazuo
Eed Hitachi Tokyo Electronics Co. Ltd.
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Nakamura Yuko
Eed Hitachi Tokyo Electronics Co. Ltd.
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