IRIE Takashi | Central Research Laboratory, Hitachi Ltd.
スポンサーリンク
概要
関連著者
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Irie T
Kyoto Univ. Kyoto Jpn
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IRIE Takashi
Central Research Laboratory, Hitachi Ltd.
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Mitsui Y
Semiconductor & Integrated Circuits Division Hitachi Ltd.
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MITSUI Yasuhiro
Central Research Laboratory, Hitachi Ltd.
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KURIYAMA Katsumi
Sales and Marketing Division, Hitachi Tokyo Electronics Co., Ltd.
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Kuriyama Katsumi
Sales And Marketing Division Hitachi Tokyo Electronics Co. Ltd.
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Mizokami Kazuaki
Precision Center Hitachi Tokyo Electronics Co. Ltd.
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Motai Kumi
Institute For Materials Research (imr) Tohoku University
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Motai Kumi
Central Research Laboratory Hitachi Ltd.
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Iijima S
Fundamental Research Laboratories Nec Corporation
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Iijima Sumio
Fundamental Research Laboratories Nec Corporation
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MITSUI Yasuhiro
Semiconductor & Integrated Circuits Division, Hitachi Ltd.
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Hasumi K
Tokyo Noko Univ. Tokyo Jpn
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ITOGA Toshihiko
Central Research Laboratories, Hitachi Ltd.
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Iijima Shimpei
Central Research Laboratory Hitachi Ltd.
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MIZOKAMI Kazuaki
EED, Hitachi Tokyo Electronics Co., Ltd.
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KURIYAMA Katsumi
EED, Hitachi Tokyo Electronics Co., Ltd.
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Itoga T
Central Research Laboratory Hitachi Ltd.
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Itoga Toshihiko
Central Research Laboratories Hitachi Ltd.
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Saiki A
Tokyo Inst. Technol. Tokyo Jpn
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Okuhira H
Central Research Laboratory Hitachi Ltd.
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Okuhira Hidekazu
Central Research Laboratory Hitachi Ltd.
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SAIKI Atsushi
Industrial Environment Control Facilities Division, Hitachi Plant Engineering & Construction Co., Lt
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HASUMI Keiji
EED, Hitachi Tokyo Electronics Co., Ltd.
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NAKANO Kazuo
EED, Hitachi Tokyo Electronics Co., Ltd.
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NAKAMURA Yuko
EED, Hitachi Tokyo Electronics Co., Ltd.
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MIZOKAMI Kazuaki
Precision Center, Hitachi Tokyo Electronics Co., Ltd.
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HASUMI Keiji
Precision Center, Hitachi Tokyo Electronics Co., Ltd.
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Nakano Kazuo
Eed Hitachi Tokyo Electronics Co. Ltd.
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Nakamura Yuko
Eed Hitachi Tokyo Electronics Co. Ltd.
著作論文
- The Effect of Isopropyl Alcohol Adsorption on the Electrical Characteristics of Thin Oxide
- The Effect of IPA Adsorption on Thin Oxide
- Quantitative Analysis of Trace Water in Monosilane Gas Using Atmospheric-Pressure Ionization Mass Spectrometer with Bicompartment Ion Source
- Quantitative Analysis of Trace Water in Highly Puified Nitrogen Gas by Atmospheric Pressure Ionization Mass Spectrometer
- A New Atmospheric Pressure Ionization Mass Spectrometer for the Analysis of Trace Gas Impurities in Silicon Source Gases used for Semiconductor Fabrication
- Quantitative Analysis of Trace Hydrogen in Highly Purified Nitrogen Gas Using Rapid Reactions in Atmospheric Pressure Ionization Mass Spectrometer
- A Drift Tube for Monitoring ppb Trace Water