Three-Dimensional Proximity Effect Correction for Multilayer Structures in Electron Beam Lithography
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-06-30
著者
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ARIMOTO Hiroshi
Fujitsu Laboratories Ltd.
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OGINO Kozo
Fujitsu Ltd.
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HOSHINO Hiromi
Fujitsu Ltd.
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MACHIDA Yasuhide
Fujitsu Ltd.
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OSAWA Morimi
Fujitsu Ltd.
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MARUYAMA Takashi
Fujitsu Limited
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KAWAMURA Eiichi
Fujitsu Limited
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- FOREWORD
- Precise Line-and-Space Monitoring Results by Ellipsometry
- Three-Dimensional Proximity Effect Correction for Multilayer Structures in Electron Beam Lithography
- High-Speed Proximity Effect Correction System for Electron-Beam Projection Lithography by Cluster Processing
- Full-Chip Lithography Verification for Multilayer Structure in Electron-Beam Lithography
- Simple Method of Correcting Optical Proximity Effect for 0.35 µm Logic LSI Circuits