Novel Optimization of Total Alignment Error Factors

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1997-12-30

著者

• KAWAMURA Eiichi

  Fujitsu Limited

• Kawamura E

  Fujitsu Ltd. Mie Jpn

• KONNO Yasuhiko

  Fujitsu Limited

• YAO Teruyoshi

  Fujitsu Limited

• Konno Y

  Tohoku Univ. Sendai Jpn

関連論文

• Three-Dimensional Proximity Effect Correction for Multilayer Structures in Electron Beam Lithography
• Novel Optimization of Total Alignment Error Factors
• KrF Resist Pattern Monitoring by Ellipsometry
• FOREWORD
• Three-Dimensional Proximity Effect Correction for Multilayer Structures in Electron Beam Lithography
• Simple Method of Correcting Optical Proximity Effect for 0.35 µm Logic LSI Circuits

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