Precise Line-and-Space Monitoring Results by Ellipsometry
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概要
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I have demonstrated rapid and nondestructive line-and-space monitoring by ellipsometry. With this method, subquartermicron line-and-space chloromethylated poly-α-methylstyrene (CMS) negative electron beam resist patterns with linewidths varying in 10 nm increments are clearly distinguishable with good repeatability. I also showed that ellipsometry is an effective tool for monitoring polysilicon line-and-space patterns and their cross-sectional line shape variation. These capabilities are essential for future in-line monitoring of relative linewidth fluctuations.
- 社団法人応用物理学会の論文
- 1997-02-01
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