Photoreflectance and Photoluminescence Study of (GaAs)_m/(AlAs)_5 (m=3-11)Superlattices: Direct and Indirect Transition
スポンサーリンク
概要
- 論文の詳細を見る
Photoreflectance and photoluminescence measurements are carried out to in-vestigate optical properties of (GaAs)./ (AIAs), superlattices with m = 3, 5, 7, 9 and1 l at room temperature, in order to clarify the cross over of the direct and indirect op-tical transition. Combining the transition energies determined from the photoreflecLance measurements with the photoluminescence data, the superlattices are shown tobe indirect for m<7 and direct for m>7. Energy band calculations based on thesp's' tight-binding method are found to explain these results consistently. The lowestallowed direct transition energy obtained from the tight-binding theory agrees wellwith the energy gap determined from the photoreflectance measurements, whereas thelowest-lying indirect gap agrees with the photoluminescence peak energy for m< 7.[photoreflectance, short period superlattices, (GaAs)./ (AIAs)., photolumines- ll cence, direct transition, indirect transition, electronic structure of superlattices l
- 社団法人日本物理学会の論文
- 1989-06-15
著者
-
TANIGUCHI Kenji
Department of Cancer Research, Fuji Gotemba Research Laboratories, Chugai and Pharmaceutical Co
-
HIYAMIZU Satoshi
Graduate School of Engineering Science, Osaka University
-
Hamaguchi Chihiro
Department Of Electronic Engineering Faculty Of Engineering Osaka University
-
Hamaguchi Chihiro
Deparimsnt Of Elecironics Facully Of Engineering Osaka University
-
Fujimoto Hiroki
Department Of Chemistry Faculty Of Science Kyoto University
-
SASA Shigehiko
Fujitsu Laboratories Ltd.
-
Hiyamizu S
Osaka Univ. Osaka Jpn
-
FUJIMOTO Hidetoshi
Department of Electronic Engineering,Faculty of Engineering,Osaka University
-
IMANISHI Kenji
Department of Electronic Engineering,Faculty of Engineering,Osaka University
-
NALAZAWA Takeshi
Department of Electronic Engineering,Faculty of Engineering,Osaka University
-
HIYAMIZU Satoshi
Department of Materials Physics,Faculty of Engineering Science,Osaka University
-
Fujimoto Hidetoshi
Department Of Electronic Engineering Faculty Of Engineering Osaka University
-
Sasa S
Fujitsu Laboratories Ltd.
-
Imanishi Kenji
Department Of Electronic Engineering Faculty Of Engineering Osaka University
-
Sasa Shigehiko
Nanomaterials Microdevices Research Center Osaka Institute Of Technology
-
Nakazawa T
Department Of Electronic Engineering Faculty Of Engineering Osaka University
-
Nakazawa Takeshi
Department Of Electronic Engineering Faculty Of Engineering Osaka University
-
Taniguchi Kenji
Department Of Biotechnology Tottori University
-
Fujimoto Hidetoshi
Department of Chemistry, Faculty of Science, Kyoto University
関連論文
- Effective Cancer Targeting Using an Anti-tumor Tissue Vascular Endotheliumm specific Monoclonal Antibody (TES-23)
- Surface Corrugation of GaAs Layers Grown on (775)B-Oriented GaAs Substrates by Molecular Beam Epitaxy
- Extremely Flat Interfaces in In_xGa_As/Al_Ga_As Quantum Wells Grown on (411)A GaAs Substrates by Molecular Beam Epitaxy
- Extremely Flat Interfaces in In_xGa_As/Al_Ga_As Quantum Wells Grown on (411)A GaAs Substrates by MBE
- High-Density GaAs/AlAs Quantum Wires Grown on (775)B-Oriented GaAs Substrates by Molecular Beam Epitaxy
- Highly Uniform GaAs/AIAs Quantum Wires Grown on [001] Ridges of GaAs(100) Patterned Substrates by Molecular Beam Epitaxy
- Extremely Flat Interfaces in GaAs/AlGaAs Quantum Wells Grown on GaAs (411)A Substrates by Molecular Beam Epitaxy
- Atomic configuration of boron pile-up at the Si/SiO2 interface
- Influences of Point and Extended Defects on As Diffusion in Si(Structure and Mechanical and Thermal Properties of Condensed Matter)
- Tunneling Hot Electron Transistor Using GaAs/AlGaAs Heterojunctions
- Process Variation Compensation Technique for 0.5-V Body-Input Comparator
- Process Variation Compensation Technique for Voltage-controlled Ring Oscillator
- Analytical Expression Based Design of a Low-Voltage FD-SOI CMOS Low-Noise Amplifier(Analog Circuit Techniques and Related Topics)
- Ultralow-Power Current Reference Circuit with Low Temperature Dependence(Building Block, Analog Circuit and Device Technologies)
- Watch-Dog Circuit for Quality Guarantee with Subthreshold MOSFET Current(New System Paradigms for Integrated Electronics)
- Watchdog Circuit for Product Degradation Monitor using Subthreshold MOS Current
- A New Analog Correlator Circuit for DS-CDMA Wireless Applications
- Error Analysis on Simultaneous Data Transfers in CDMA Wired Interface
- C-12-26 An Auto-sensitivity Control Circuit for DS-CDMA Receiver Circuit
- Influence of N_2O Oxynitridation on Interface Trap Generation in Surface-Channel p-Channel Metal Oxide Semiconductor Field Effect Transistors
- Influence of N_2O-Oxynitridation on Interface Trap Generation in Surface-Channel PMOSFETs
- Temperature Dependence of Electron Mobility in InGaAs/InAlAs Heterostructures
- Novel Method of Intrinsic Characteristic Extraction in Lightly Doped Drain Metal Oxide Semiconductor Field Effect Transistors for Accurate Device Modeling
- Display Wall Empowered Visual Mining for CEOP Data Archive(Coordinated Enhanced Observing Period(CEOP))
- Initial CEOP-based Review of the Prediction Skill of Operational General Circulation Models and Land Surface Models(Coordinated Enhanced Observing Period(CEOP))
- Studies of Boron Segregation to {311} Defects in Silicon-Implanted Silicon
- Boron Segregation to {311} Defects Induced by Self-Implantation Damage in Si
- Boron Accumulation in the {311} Defect Region Induced by Self-Implantation into Silicon Substrate
- Impact Excitation of Carriers in Diamond under Extremely High Electric Fields
- Hole Trapping and Detrappirug Characteristics Investigated by Substrate Hot-Hole Injection into Oxide of Metal-Oxide-Semiconduetor Structure
- Hot-Hole-Induced Interface State Generation in p-Channel MOSFETs with Thin Gate Oxide
- Evaluation of Spatial Distribution of Hole Traps Using Depleted Gate MOSFETs
- Analytical Device Model of SOI MOSFETs Including Self-Heating Effect
- Spatial Distribution of Trapped Holes in the Oxide of Metal Oxide Semiconductor Field-Effect Transistors after Uniform Hot-Hole Injection
- Existence of Double-Charged Oxide Traps in Submicron MOSFET's (SOLID STATE DEVICES AND MATERIALS 1)
- Interface State Generation Mechanism in MOSFET's during Substrate Hot-Electron Injection : Special Section : Solid State Devices and Materials 2 : Silicon Devices and Process Technologies
- Hot Electron Drift Velocity in AlGaAs/GaAs Heterojunctions : Electrical Properties of Condensed Matter
- Monte Carlo Study of Hot Electron Transport in Quantum Wells : Electrical Properties of Condensed Matter
- Role of Boron Atoms on Fluorine Diffusion under Various Stages of Annealing
- Boron Emission Rate from Si/SiO_2 Interface Traps to Bulk Silicon for Dose Loss Modeling
- Dependence of Gate Leakage Current on Location of Soft Breakdown Spot in Metal-Oxide-Semiconductor Field-Effect Transistor
- Effect of Oxide Breakdown on Complementary Metal Oxide Semiconductor Circuit Operation and Reliability
- A Study of Pre-Breakdown in Ultra-Thin Silicon Dioxide Films Using Carrier Separation Measurement
- Trap Density Dependent Inelastic Tunneling in Stress-Induced Leakage Current
- Trap Density Dependent Inelastic Tunneling in Stress-Induced Leakage Current
- Ensemble Monte Carlo/Molecular Dynamics Simulation of Inversion Layer Mobility in Si MOSFETs : Effects of Substrate Impurity(the IEEE International Coference on SISPAD '02)
- New Nondestructive Carrier Profiling for Ion Implanted Si Using Infrared Spectroscopic Ellipsometry
- Crossover of Direct and Indirect Transitions in (GaAs)_m/(AlAs)_5 Superlattices (m=1-11)
- Photoreflectance and Photoluminescence Study of (GaAs)_m/(AlAs)_5 (m=3-11)Superlattices: Direct and Indirect Transition
- Two-Dimensional Simulation of Quantum Tunneling across Barrier with Surface Roughness
- Effect of H_2 on the Quality of Si-Doped Al_xGa_As Grown by MBE
- Electronic States in Selectively Si-Doped N-AlGaAs/GaAs/N-AlGaAs Single Quantum Well Structures Grown by MBE
- Improved 2DEG Mobility in Inverted GaAs/n-AlGaAs Heterostructures Grown by MBE
- Implantation into an AlGaAs/GaAs Heterostructure : B-6: III-V DEVICE TECHNOLOGY
- Dependence of the Mobility and the Concentration of Two-Dimensional Electron Gas in Selectively Doped GaAs/N-Al_xGa_As Heterostructure on the AlAs Mole Fraction
- Electrical Properties of Si-Doped Al_xGa_As Layers Grown by MBE
- Quantum Well Width Dependence of Negative Differential Resistance of In_Al_As/In_Ga_As Resonant Tunneling Barriers Grown by MBE
- Extremely High 2DEG Concentration in Selectively Doped In_Ga_As/N-In_Al_As Heterostructures Grown by MBE
- Conduction Band Edge Discontinuity of In_Ga_As/In_(Ga_1 _xAl_x)_As(0≦x≦1) Heterostructures
- MBE Growth of InGaAlAs Lattice-Matched to InP by Pulsed Molecular Beam Method
- MBE Growth of High-Quality GaAs Using Triethylgallium as a Gallium Source
- Selectively Doped GaAs/ N-Al_Ga_As Heterostructures Grown by Gas-Source MBE : Semiconductors and Semiconductor Devices
- Effect of flatness of heterointerfaces on device performance of InP-based HEMTs
- Effect of Bottom SiN Thickness for AlGaN/GaN Metal-Insulator-Semiconductor High Electron Mobility Transistors Using SiN/SiO_2/SiN Triple-Layer Insulators
- AlGaN/GaN MIS-HEMTs Fabricated Using SiN/SiO_2/SiN Triple-Layer Insulators
- Non-Recessed-Gate Enhancement-Mode AlGaN/GaN High Electron Mobility Transistors with High RF Performance
- Extremely High-Speed Lattice-Matched InGaAs/InAlAs High Electron Mobility Transistors with 472 GHz Cutoff Frequency
- Fabrication Technology and Device Performance of Sub-50-nm-Gate InP-Based High Electron Mobility Transistors
- High RF Performance of 50-nm-Gate Lattice-Matched InAlAs/InGaAs HEMTs (Joint Special Issue on Heterostructure Microelectronics with TWHM 2000)
- Temperature Dependence of Electron Mobility in Si Inversion Layers
- A Low Power 622MHz CMOS Phase-Locked Loop with Source Coupled VCO and Dynamic PFD (Special Section of Papers Selected from ITC-CSCC'96)
- Identification of Functionally Important Amino Acid Residues in Zymomonas mobilis Levansucrase
- A Low-Voltage SOI-CMOS LC-Tank VCO with Double-Tuning Technique Using Lateral P-N Junction Variable Capacitance(Special lssue on Silicon RF Device & Integrated Circuit Technologies)
- Novel Method of Modulation Spectroscopy for Heterostructures: Electro-Photoreflectance
- Electroreflectance Study of Cd_xHg_Te
- Optical Constants of HgTe and HgSe
- Electroreflectance Measurements on Cd_xHg_Te
- A-3-1 A 5Msample/s 0.965-mW Switched-Capacitor Filter in 0.6-μm CMOS Technology
- High-Sensitivity SOI MOS Photodetector with Self-Amplification
- High Sensitivity Photodetector with Self-Amplification Capability
- A Low Power Analog Matched-Filter with Smart Sliding Correlation
- Study of a Length Coefficient for an Extended Drift-Diffusion Model for Metal-Oxide-Semiconductor (MOS) Device Simulation
- Impact Ionization Model Using Average Energy and Average Square Energy of Distribution Function
- Novel Impact Ionization Model for Device Simulation Using Generalized Moment Conservation Equations
- A-5-3 Speed-Power-Resolution Tradeoff in Analog Correlator Circuit
- Direct Observation of Gaussian-Type Energy Distribution for Hot Electrons in Silicon
- Strain Evaluation at Si/Si0_2 Interface Using the Electroreflectance Method
- Temperature Dependence of k_BTC Noise in "Coulomb Blockade" Regime
- Theoretical Study of Minority Carrier Lifetimes due to Auger Recombination in n-type Silicon
- A Short Channel HEMT Model for Circuit Simulation Based on Physical Structure
- Quantification of Electrical Deactivation by Triply Negative Charged Ga Vacancies in Highly Doped Thin GaAs Layers
- Increasing Atmospheric Temperature in the Upper Troposphere and Cumulus Convection over the Eastern Part of the Tibetan Plateau in the Pre-Monsoon Season of 2004(Coordinated Enhanced Observing Period(CEOP))
- Application of Kelvin Technique in A Gas-Sensor Read-Out Circuit
- A Switched-Capacitor Programmable Gain Amplifier Using Dynamic Element Matching
- Asymmetric Single Electron Turnstile and Its Electronic Circuit Applications (Special Issue on Technology Challenges for Single Electron Devices)
- Physical Models for Deep Submicron Device Simulation
- Floating Voltage Reference Generator for A/D Converters
- Magnetophonon Resonance at High Electric and Magnetic Fields in Small n^+nn^+ GaAs Structures
- A Self-Consistent Monte Carlo Simulation for Two-Dimensional Electron Transport in MOS Inversion Layer
- Fine structures in Optical Absorption Spectra of MnO