Strain Evaluation at Si/Si0_2 Interface Using the Electroreflectance Method
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-06-15
著者
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TANIGUCHI Kenji
Department of Cancer Research, Fuji Gotemba Research Laboratories, Chugai and Pharmaceutical Co
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Hamaguchi Chihiro
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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Hamaguchi Chihiro
Department Of Electronics Faculty Of Engineering Osaka University
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Hamaguchi Chihiro
Deparimsnt Of Elecironics Facully Of Engineering Osaka University
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Morifuji M
Osaka Univ. Suita Jpn
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Morifuji Masato
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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Yongwattanasoontorn Pornchai
Department Of Electronics Faculty Of Engineering Osaka University
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Ozawa Yoshio
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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OZAWA Yoshio
ULSI Research Center, Toshiba Corporation
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Taniguchi Kenji
Department Of Electronics Faculty Of Engineering Osaka University
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Taniguchi Kenji
Department Of Biotechnology Tottori University
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