Spatial Distribution of Trapped Holes in the Oxide of Metal Oxide Semiconductor Field-Effect Transistors after Uniform Hot-Hole Injection

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1991-12-30

著者

• 安田 直彦

  岐阜大工

• Yasuda Naoki

  Department Of Electronic Engineering Faculty Of Engineering Osaka University

• Quazi Deen

  Department Of Electronic Engineering Faculty Of Engineering Osaka University

• TANIGUCHI Kenji

  Department of Cancer Research, Fuji Gotemba Research Laboratories, Chugai and Pharmaceutical Co

• Taniguchi K

  Department Of Electronic Engineering Faculty Of Engineering Osaka University

• Hamaguchi C

  Osaka Univ. Osaka Jpn

• Hamaguchi Chihiro

  Department Of Electronic Engineering Faculty Of Engineering Osaka University

• Hamaguchi Chihiro

  Deparimsnt Of Elecironics Facully Of Engineering Osaka University

• MARUYAMA Akinori

  Department of Electronic Engineering, Osaka University

• Maruyama Akinori

  Department Of Electronic Engineering Osaka University

• Maruyama Akinori

  Department Of Electrical Engineering Faculty Of Engineering Doshisha University

• Taniguchi Kenji

  Department Of Biotechnology Tottori University

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