A Study of Pre-Breakdown in Ultra-Thin Silicon Dioxide Films Using Carrier Separation Measurement

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概要

• 論文の詳細を見る
• 社団法人電子情報通信学会の論文
• 2003-04-01

著者

• ISHIDA Akihiro

  Department of Electrical and Electronic Engineering, Shizuoka University

• TANIGUCHI Kenji

  Department of Cancer Research, Fuji Gotemba Research Laboratories, Chugai and Pharmaceutical Co

• Kamakura Y

  Department Of Electronics And Information Systems Osaka University

• Kamakura Yoshinari

  Department Of Electronics And Information Systems Osaka University

• Kamakura Yoshinari

  Department Of Electronic Information And Energy Engineering Graduate School Of Eng. Osaka University

• Taniguchi K

  Department Of Electronic Information And Energy Engineering Graduate School Of Eng. Osaka University

• UNO Shigeyasu

  Department of Electronic, Information and Energy Engineering, Graduate School of Eng., Osaka Univers

• Ishida Akihiro

  Department Of Applied Physics The National Defense Academy

• Ishida Akihiro

  Department Of Electronic Information And Energy Engineering Graduate School Of Eng. Osaka University

• Uno Shigeyasu

  Department Of Electronic Information And Energy Engineering Graduate School Of Eng. Osaka University

• Uno Shigeyasu

  Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ

• Taniguchi Kenji

  Department Of Biotechnology Tottori University

• Uno Shigeyasu

  Department of Electrical and Computer Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan

• Kamakura Yoshinari

  Department of Electronic Engineering, Osaka University, Suita, Osaka 565-0871, Japan

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