Simulation of Dopant Redistribution During Gate Oxidation Including Transient-Enhanced Diffusion Caused by Implantation Damage
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-05-15
著者
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NISHIMURA Tadashi
ULSI Laboratory, Mitsubishi Electric Corporation
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TERAMOTO Akinobu
ULSI Development Center, Mitsubishi Electric Corporation
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Hamaguchi Chihiro
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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Hamaguchi Chihiro
Deparimsnt Of Elecironics Facully Of Engineering Osaka University
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Hamaguchi Chihiro
Department Of Electronic Engineering Osaka University
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UCHIDA Tetsuya
ULSI Laboratory, Mitsubishi Electric Corporation
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EIKYU Katsumi
ULSI Development Center, Mitsubishi Electric Corporation
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Teramoto Akinobu
Ulsi Development Center Mitsubishi Electric Corporation
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Teramoto Akinobu
Ulsi Laboratory Mitsubishi Electric Corporation
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Teramoto Akinobu
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Nishimura Tadashi
The Ulsi Development Center Mitsubishi Electric Corporation
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Nishimura Tadashi
Ulsi Research And Development Center Mitsubishi Electric Corporation
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Yamashita Tomohiro
Ulsi Development Center Mitsubishi Electric Corporation
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Yamashita Tomohiro
Ulsi Research And Development Center Mitsubishi Electric Corporation
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TSUKUDA Eiji
ULSI Research and Development Center, Mitsubishi Electric Corporation
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FUJINAGA Masato
ULSI Research and Development Center, Mitsubishi Electric Corporation
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KUNIKIYO Tatsuya
ULSI Research and Development Center, Mitsubishi Electric Corporation
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ISHIKAWA Kiyoshi
ULSI Research and Development Center, Mitsubishi Electric Corporation
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KOTANl Norihiko
ULSI Research and Development Center, Mitsubishi Electric Corporation
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KAWAZU Satoru
Department of Electronics and Photonic Systems Engineering, Kochi University of Technology
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Ishikawa K
Mitsubishi Electric Corp. Itami‐shi Jpn
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Tsukuda E
Kyowa Hakko Kogyo Co. Ltd. Shizuoka Jpn
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Tsukuda Eiji
Ulsi Research And Development Center Mitsubishi Electric Corporation
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Kawazu S
Department Of Electronics And Photonic Systems Engineering Kochi University Of Technology
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Eikyu K
Mitsubishi Electric Corp. Hyogo Jpn
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Eikyu Katsumi
Ulsi Development Center Mitsubishi Electric Corporation
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Ishikawa K
Renesas Technol. Corp. Hyogo Jpn
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Ishikawa Kiyoshi
Ulsi Development Center Mitsubishi Electric Corporation
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Fujinaga Masato
Ulsi Research And Development Center Mitsubishi Electric Corporation
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Uchida T
Department Of Molecular Biotechnology Graduate School Of Advanced Sciences Of Matter Hiroshima Unive
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Kotani N
Ulsi Research And Development Center Mitsubishi Electric Corporation
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Uchida T
Semiconductor Leading Edge Technol. Inc. Yokohama Jpn
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Uchida Tetsuya
Ulsi Development Center Mitsubishi Electric Corporation
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Kunikiyo T
Mitsubishi Electric Corp. Itami‐shi Jpn
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Kunikiyo Tatsuya
Ulsi Development Center Mitsubishi Electric Corporation
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Nishimura Tadashi
Ulsi Development Center Mitsubishi Electric Corporation
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Kawazu Satoru
Department of Electronic and Photonic Systems Engineering, Kochi University of Technology, Tosayamada, Kochi 782-0003, Japan
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