Analysis of the Delay Distributions of 0.5μm SOI LSIs (Special Issue on SOI Devices and Their Process Technologies)
スポンサーリンク
概要
- 論文の詳細を見る
A high-speed silicon-on-insulator (SOI) of a 1/8 frequency divider and a 64-bit adder were realized using an optimized gate-overlapped LDD and a self-aligned titanium silicide (TiSi_2) source-drain structure. The advantages of the delay time and power consumption were analyzed by circuit simulation. The maximum operation frequency of the SOI divider is 2.9GHz at 3.3V. The SOI divider operates about 1.6 times faster than the bulk-Si divider. The power consumption of the SOI divider at the maximum operating frequency is about 60% of that of the bulk divider. On the other hand, the speed of the SOI adder is 1.9 nsec at 3.3V. The SOI adder speed is about 1.3 times faster than the bulk adder. The power consumption of the SOI adder is about 80% of that of the bulk divider. It was found that the high speed, low power features of the SOI divider were due to the pass transistor which had low junction capacitance and little substrate bias effects, in addition to the low wiring capacitance and low fanout capacitance compared to the bulk adder. As a result, it is suggested that SOI circuits using pass transistor have a potential for GHz level systems and it is expected they will be applied to handy communication systems and portable computers used in the multimedia era.
- 社団法人電子情報通信学会の論文
- 1997-03-25
著者
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YAMAGUCHI Yasuo
Institute for Materials Research, Tohoku University
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Hirao T
Advanced Device Development Dept. Renesas Technology Corp.
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Yamaguchi Y
Tohoku Univ. Sendai
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Yamaguchi Y
Kumamoto Techno Res. Park Kumamoto Jpn
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IWAMATSU Toshiaki
ULSI Laboratory, Mitsubishi Electric Corporation
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YAMAGUCHI Yasuo
ULSI Laboratory, Mitsubishi Electric Corporation
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MAEGAWA Shigeto
ULSI Laboratory, Mitsubishi Electric Corporation
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NISHIMURA Tadashi
ULSI Laboratory, Mitsubishi Electric Corporation
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UEDA Kimio
System LSI Development Center, Mitsubishi Electric Corporation
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IPPOSHI Takashi
ULSI Development Center, Mitsubishi Electric Corporation
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MASHIKO Koichiro
System LSI Development Center, Mitsubishi Electric Corporation
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INOUE Yasuo
ULSI Development Center, Mitsubishi Electric Corporation
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YASUOKA Akihiko
ULSI Laboratory, Mitsubishi Electric Corporation
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HIRAO Tadashi
ULSI Laboratory, Mitsubishi Electric Corporation
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IWAMATSU Toshiaki
Advanced Device Development Dept., Renesas Technology Corp.
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IPPOSHI Takashi
Advanced Device Development Dept., Renesas Technology Corp.
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Ueda K
Mitsubishi Electric Corp. Itami‐shi Jpn
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Ueda Kimio
System Lsi Development Center Mitsubishi Electric Corp.
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Inoue Y
National Defense Acad. Yokosuka Jpn
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Maegawa Shigeto
Advanced Device Development Dept. Renesas Technology Corp.
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Yamaguchi Y
Central Workshop Osaka University
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Ueda K
System Lsi Laboratory Mitsubishi Electric Corporation
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Maegawa Shigeto
Ulsi Development Center Mitsubishi Electric Corporation
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Yasuoka Akihiko
Ulsi Laboratory Mitsubishi Electric Corporation
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Ipposhi Takashi
Advanced Device Development Dept. Renesas Technology Corp.
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Mashiko Koichiro
The Ulsi Development Center Mitsubishi Electric Corporation
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Mashiko Koichiro
System Lsi Development Center Mitsubishi Electric Corporation
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Mashiko Koichiro
System Lsi Laboratory Mitsubishi Electric Corporation
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Nishimura Tadashi
The Ulsi Development Center Mitsubishi Electric Corporation
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Nishimura Tadashi
Ulsi Research And Development Center Mitsubishi Electric Corporation
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Iwamatsu Toshiaki
Advanced Device Development Dept. Renesas Technology Corp.
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Ueda K
Ntt Atsugi‐shi Jpn
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Inoue Y
Ntt Access Network Service Systems Laboratories Ntt Corporation
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Ueda Katsuhiko
Department Of Information Engineering Nara National College Of Technology
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Ipposhi T
Advanced Device Development Dept. Renesas Technology Corp.
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Inoue Yasuo
Ulsi Development Center Mitsubishi Electric Corporation
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Nishimura Tadashi
Ulsi Development Center Mitsubishi Electric Corporation
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