3-D Topography and Impurity Integrated Process Simulator (3-D MIPS) and Its Applications (Special Issue on TCAD for Semiconductor Industries)
スポンサーリンク
概要
- 論文の詳細を見る
We have developed a practical 3-D integrated process simulator (3-D MIPS) based on the orthogonal grid. 3-D MIPS has a 3-D topography simulator (3-D MULSS) and 3-D impurity simulator which simulates the processes of ion implantation, impurity diffusion and oxidation. In particular, its diffusion and segregation model is new and practical. It assumes the continuity of impurity concentration at the material boundary in order to coordinate with the topography simulator (3-D MULSS) with cells in which two or more kinds of materials exist. And then, we introduced a time-step control method using the Dufort-Frankel method of diffusion analysis for stable calculation, and a selective oxidation model to apply to more general structures than LOCOS structure. After that, the 3-D MIPS diffusion model is evaluated compared with experimental data. Finally, the 3-D MIPS is applied to 3-D simulations of the nM0STr. structure with LOCOS isolation, wiring interconnect and pnjunction capacitances, and DRAM storage node area.
- 社団法人電子情報通信学会の論文
- 1999-06-25
著者
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NISHIMURA Tadashi
ULSI Laboratory, Mitsubishi Electric Corporation
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UCHIDA Tetsuya
ULSI Laboratory, Mitsubishi Electric Corporation
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EIKYU Katsumi
ULSI Development Center, Mitsubishi Electric Corporation
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Nishimura Tadashi
The Ulsi Development Center Mitsubishi Electric Corporation
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Nishimura Tadashi
Ulsi Research And Development Center Mitsubishi Electric Corporation
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TSUKUDA Eiji
ULSI Research and Development Center, Mitsubishi Electric Corporation
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FUJINAGA Masato
ULSI Research and Development Center, Mitsubishi Electric Corporation
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KUNIKIYO Tatsuya
ULSI Research and Development Center, Mitsubishi Electric Corporation
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ISHIKAWA Kiyoshi
ULSI Research and Development Center, Mitsubishi Electric Corporation
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KAWAZU Satoru
Department of Electronics and Photonic Systems Engineering, Kochi University of Technology
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Ishikawa K
Mitsubishi Electric Corp. Itami‐shi Jpn
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SONODA Kenichiro
ULSI Development Center,Mitsubishi Electric Corporation
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KAWAZU Satoru
the Department of Electronic and Photonic Systems Engineering, Kochi University of Technology
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Tsukuda E
Kyowa Hakko Kogyo Co. Ltd. Shizuoka Jpn
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Tsukuda Eiji
Ulsi Research And Development Center Mitsubishi Electric Corporation
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Kawazu S
Department Of Electronics And Photonic Systems Engineering Kochi University Of Technology
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Eikyu K
Mitsubishi Electric Corp. Hyogo Jpn
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Eikyu Katsumi
Ulsi Development Center Mitsubishi Electric Corporation
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Ishikawa K
Renesas Technol. Corp. Hyogo Jpn
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Ishikawa Kiyoshi
Ulsi Development Center Mitsubishi Electric Corporation
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Fujinaga Masato
Ulsi Research And Development Center Mitsubishi Electric Corporation
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Uchida T
Department Of Molecular Biotechnology Graduate School Of Advanced Sciences Of Matter Hiroshima Unive
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Uchida T
Semiconductor Leading Edge Technol. Inc. Yokohama Jpn
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Uchida Tetsuya
Ulsi Development Center Mitsubishi Electric Corporation
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Kunikiyo T
Mitsubishi Electric Corp. Itami‐shi Jpn
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Kunikiyo Tatsuya
Ulsi Development Center Mitsubishi Electric Corporation
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Sonoda Kenichiro
Ulsi Development Center Mitsubishi Electric Corporation
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Nishimura Tadashi
Ulsi Development Center Mitsubishi Electric Corporation
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