Sekiguchi Atsushi | ANELVA CORP., Yotsuya 5-8-1, Fuchu 183-8508, Japan
スポンサーリンク
概要
関連著者
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SEKIGUCHI Atsushi
ANELVA Corporation
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Sekiguchi Atsushi
ANELVA CORP., Yotsuya 5-8-1, Fuchu 183-8508, Japan
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HOSOKAWA Naokichi
ANELVA CORPORATION
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Kobayashi Tsukasa
Anelva Corporation
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ASAMAKI Tatsuo
ANELVA Corporation
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ASAMAKI Tatsuo
Department of Electrical Engineering, Science University of Tokyo
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Asamaki T
Tokyo Univ. Sci. Tokyo Jpn
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Hosokawa N
Anelva Corp. Tokyo Jpn
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Sekiguchi A
Anelva Corp. Tokyo Jpn
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IHARA Hideo
Electrotechnical Laboratory
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Toyota N
Physics Department Graduate School Of Science Tohoku University
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Namiki Takahisa
Institute For Materials Research Tohoku University
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Toyota Naoki
The Research Institute For Iron Steel And Other Metals Tohoku University
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Tateiwa Naoyuki
Graduate School Of Science Tohoku University:(present) Department Of Physical Science Graduate Schoo
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TERADA Norio
Electrotechnical Laboratory
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Jo Masatoshi
Electrotechnical Laboratory
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YANAGI Yousuke
IMRA Material R & D Co Ltd.
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ITOH Yoshitaka
IMRA Material R & D Co Ltd.
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Ikuta Hiroshi
Department Of Applied Physics The University Of Tokyo
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Imai Atsuo
Nagoya Industrial Science Research Institute
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HAZAMA Hirofumi
Nagoya Industrial Science Research Institute
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MATSUDA Takashi
DIAX Co., Ltd.
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SAKURAI Kazuo
ANELVA CORP.
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TAKAGI Shinji
ANELVA Corporation
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Suetaka Wataru
Department Of Materials Science Faculty Of Engineering Tohoku University
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Wadayama Toshimasa
Department Of Materials Science Faculty Of Engineering Tohoku University
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Mizutani Uichiro
Department Of Crystalline Materials Science Nagoya University
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Terada N
Musashi Inst. Technology Tokyo
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Ikuta Hiroshi
Department of Crystalline Materials Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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Hazama Hirofumi
Nagoya Industrial Science Research Institute, Anagahora 2271-130, Shimoshidami, Moriyama-ku, Nagoya 463-0003, Japan
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Itoh Yoshitaka
IMRA MATERIAL R&D Co., Ltd., Hachiken-cho 5-50, Kariya 448-0021, Japan
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Imai Atsuo
Nagoya Industrial Science Research Institute, Anagahora 2271-130, Shimoshidami, Moriyama-ku, Nagoya 463-0003, Japan
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Yanagi Yousuke
IMRA MATERIAL R&D Co., Ltd., Hachiken-cho 5-50, Kariya 448-0021, Japan
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Sakurai Kazuo
ANELVA CORP., Yotsuya 5-8-1, Fuchu 183-8508, Japan
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Mizutani Uichiro
Department of Crystalline Materials Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
著作論文
- Gas-Temperature-Controlled (GTC) CVD of Aluminum and Aluminum-Silicon Alloy Film for VLSI Processing : Techniques, Instrumentations and Measurement
- Epitaxial Growth of Al on Si by Gas-Temperature-Controlled Chemical Vapor Deposition : Techniques, Instrumentations and Measurement
- Ba_2Y_1Cu_3O_ Oxidation by Thermodynamic Nonequilibrium High-Temperature (TNH) Plasma
- In Situ IR Spectroscopic Study of a-Si:H Films Growing under Photo-Chemical Vapor Deposition Condition : Surfaces, Interfaces and Films
- Bottom Coverage of Cu Deposit for 200-nm-Class Circular Vias with High Aspect Ratios Investigated by Magnetron Sputtering Activated Using Superconducting Bulk Magnet