Inoue Morio | Kyoto Research Laboratory Matsushita Electronics Corp.

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概要

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著作論文

Etch-Back Planarization Technique for Multilevel Metallization
Characterization of Ion Implantation Dose by Raman Scattering and Photothermal Wave Techniques
Secondary Defects of As^+ Implanted Silicon Measured by Thermal Wave Technique
Evaluation of Device Charging in Ion Implantation
Detection and Printability of Shifter Defects in Phase-Shifting Masks II. : Defocus Characteristics
Detection and Printability of Shifter Defects in Phase-Shifting Masks : Photolithography
Pattern Transfer Characteristics of Transparent Phase Shifting Mask : Photolithography
Detection and Printability of Shifter Defects in Phase-Shifting Masks
Pattern Transfer Characteristics of Transparent Phase Shifting Mask
Charge Buildup in Magnetized Process Plasma
Experimental and Theoretical Study of the Charge Build-Up in an ECR Etcher : Etching and Deposition Technology
Thermodynamics of Development Process of Positive Resists in Binary Mixed Developer : Resist Material and Process
A DUV-Defined-Negative Resist/EB-Defined-positive Resist Two-Layer Resist System for the Fabrication of T-Shaped Gate : Lithography Technology
A DUV-Defined-Negative Resist/EB-Defined-Positive Resist Two-Layer Resist System for the Fabrication of T-Shaped Gate
Thermodynamics of Development Process of Positive Resists in Binary Mixed Developer
Experimental and Theoretical Study of the Charge Build-Up in an ECR Etcher
Observation Technique for Process-Induced Defects Using Anodic Oxidation (Special Issue on Scientific ULSI Manufacturing Technology)
Epitaxial Lateral Overgrowth (ELO) of Silicon on the Whole Surface
A Novel Atomic Force Microscopy Observation Technique for Secondary Defects of Ion Implantation, using Anodic Oxidation

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