Thermodynamics of Development Process of Positive Resists in Binary Mixed Developer

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概要

• 論文の詳細を見る

• The sensitivity of positive e-beam resists depends strongly on the development condition. We have found that a small amount of water in an organic developer enhances the resist dissolution rate resulting in development instability. The addition of polar solvents to a developer causes a large increase of the dissolution rate. The reason for this enhancement of the dissolution rate is explained by thermodynamic compatibility between the resist and the developer. It is shown that thermodynamic consideration of the development process is very useful to comprehend the dissolution characteristics of positive resists in binary mixed developers.

• 社団法人応用物理学会の論文
• 1990-12-20

著者

• Inoue M

  Department Of Electrical Engineering Osaka Prefectural Technical College

• Inoue M

  Osaka Inst. Technol. Osaka Jpn

• Inoue Masami

  Association Of Super-advanced Electronics Technologies (aset)

• Inoue Masumi

  Department Of Quantum Engineering Nagoya University

• Watanabe Hirohito

  Institute Of Material Science University Of Tsukuba

• Watanabe H

  Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)

• Inoue M

  Advanced Technology R&d Center Mitsubishi Electric Corp.

• INOUE Morio

  Kyoto Research Laboratory, Matsushita Electronics Corporation

• Inoue Morio

  Kyoto Research Laboratory Matsushita Electronics Corp.

• TODOKORO Yoshihiro

  Kyoto Research Lab., Matsushita Electronics Corp.

• WATANABE Hisashi

  Kyoto Research Laboratory, Matsushita Electronics Co

• Todokoro Y

  Kyoto Research Laboratory Matsushita Electronics Corporation

• Todokoro Yoshihiro

  Kyoto Research Lab. Matsushita Electronics Corporation

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