Magnetoelastic Wave Excitation Properties of Amorphous Iron-Boron Films Prepared by RF-High Rate Sputtering
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1983-01-20
著者
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INOUE Mitsuteru
Department of Electrical and Electronic Engineering, Toyohashi University of Technology
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Inoue M
Department Of Electrical Engineering Osaka Prefectural Technical College
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Inoue Masami
Association Of Super-advanced Electronics Technologies (aset)
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Inoue Masumi
Department Of Quantum Engineering Nagoya University
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FUJII Toshitaka
Department of Electrical & Electronic Engineering, Toyohashi Univerxity of Technology
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MIYAMA Tomohiro
Deparment of Electrical Engineering and Electronics, Toyohashi University of Technology
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KUMURA Tatsuo
Department of Electrical Engineering and Electronics, Toyohashi University of Technology
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Inoue M
Advanced Technology R&d Center Mitsubishi Electric Corp.
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Inoue Mitsuteru
Department Of Electrical & Electronic Engineering Toyohashi University Of Technology
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Kumura Tatsuo
Department Of Electrical Engineering And Electronics Toyohashi University Of Technology
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Miyama T
Tokyo Univ. Sci. Yamaguchi Jpn
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Miyama Tomohiro
Deparment Of Electrical Engineering And Electronics Toyohashi University Of Technology
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Fujii Toshitaka
Deparment Of Electrical Engineering And Electronics Toyohashi University Of Technology
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Inoue Mitsuteru
Department of Electric and Electronic Engineering, Toyohashi University of Technology, Tempaku, Toyohashi, Aichi 441-8580, Japan
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