Deposition of Y-Ba-Cu-O Thin Films by RF Magnetron Sputtering with a Grid Electrode: Plasma Parameters
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概要
- 論文の詳細を見る
Sputtering conditions of Y-Ba-Cu-O films with a grid electrode were discussed from the measurements of plasma parameters. A grounded grid electrode and a suitable negative substrate bias voltage were effective for the growth of oxide superconductors especially at a lower substrate temperature around 550℃. These conditions reduced the density of high-energy charged particles near the substrate and also de-energized those particles. The grid electrode was still effective at a relatively high gas pressure above 10 Pa, although a slight modification was required for the grid configuration.
- 社団法人応用物理学会の論文
- 1990-09-20
著者
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INOUE Masumi
Department of Electronics Engineering, Nagoya University
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TAKAI Yoshiaki
Department of Electronics Engineering, Nagoya University
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HAYAKAWA Hisao
Department of Electronics Engineering, Nagoya University
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Inoue M
Department Of Electrical Engineering Osaka Prefectural Technical College
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Inoue M
Osaka Inst. Technol. Osaka Jpn
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Inoue Masami
Association Of Super-advanced Electronics Technologies (aset)
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Inoue Masumi
Department Of Quantum Engineering Nagoya University
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Takai Yoshiaki
Nagoya University
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Inoue M
Advanced Technology R&d Center Mitsubishi Electric Corp.
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Takechi Kimihiro
Department Of Electrical And Electronic Engineering Faculty Of Engineering Ehime University
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Inoue Masumi
Department Of Cell And System Physiology University Of Occupational And Environmental Health School
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Hayakawa H
Nagoya Univ. Nagoya Jpn
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Takechi K
Functional Devices Research Laboratories Nec Corporation
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TAKECHI Kazushige
Department of Electronics, Nagoya University
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Takai Yoshiaki
Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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