Submicrometer-Scale Patterning of Superconducting Nb Films Using Focused Ion Beam
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概要
- 論文の詳細を見る
We have developed a novel patterning technique for superconducting Nb films with submicrometer scales, using a focused ion beam (FIB). The technique makes use of a phenomenon wherein the plasma etching rate of Nb exposed to a Ga^+ focused ion beam is much lower than that of unexposed Nb films, when they are etched by reactive ion etching (RIE) in CF_4 plasma. The etching rate of films exposed to 100 keV Ga^+ FIB at a dose >2×10^<16>/cm^2 was less than one-quarter of that of unexposed films. Using this technique, we have fabricated 0.1-μm-wide Nb strips with the critical current density of 1×10^7 A/cm^2 at 4.2 K. This value is almost equal to that of bare films.
- 社団法人応用物理学会の論文
- 1992-04-01
著者
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TAKAI Yoshiaki
Department of Electronics Engineering, Nagoya University
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HAYAKAWA Hisao
Department of Electronics Engineering, Nagoya University
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Fujimaki Akira
Department Of Quantum Engineering Nagoya University
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Fujimaki Akira
The Department Of Quantum Engineering Faculty Of Engineering Nagoya University
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Fujimaki A
Nagoya Univ. Nagoya‐shi Jpn
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Fujimaki Akira
Nagoya Univ. Nagoya Jpn
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AKAIKE Hiroyuki
Department of Electronics, Nagoya University
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Takai Yoshiaki
Nagoya University
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Akaike Hiroyuki
Department Of Quantum Engineering Nagoya University
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Akaike Hiroyuki
Department Of Electronics Faculty Of Engineering Nagoya University
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早川 尚男
京都大学大学院人間・環境学研究科
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Akaike H
Nagoya Univ. Nagoya Jpn
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Akaike Hiroyuki
Nagoya Univ. Nagoya‐shi Jpn
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Takai Yoshiaki
Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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