Enhanced Critical Current under a Magnetic Field in Sm1+xB2-xCu3Oy Thick Films Prepared Using Low-temperature Growth Technique
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概要
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REBa2Cu3Oy films require a high critical current ($I_{\text{c}}$) under a high magnetic field at 77 K when using power applications. In this study, we fabricated Sm1.04Ba1.96Cu3Oy (SmBCO) thick films prepared using a low-temperature growth (LTG) technique in order to improve crystal quality and enhance flux pinning. The LTG multilayer thick film using a (SmBCO/Sm-rich layer) $\times$ $N$ ($N = 1, 2, \ldots$) multilayer system showed a high crystal quality. Additionally, the LTG multilayer thick film showed not only a high density of dislocations but also low-$T_{\text{c}}$ particles within a high-$T_{\text{c}}$ matrix. Therefore, the LTG multilayer film showed an $I_{\text{c}}$ of 20.6 A/cm-width (77 K, $B\parallel c$, $B = 5$ T) and had a thickness of only 1.35 μm and a low anisotropy $I_{\text{c}}$ for the high-magnetic-field direction. These results support to the developing possibility of power devices using a solenoid-type coil.
- 2007-09-25
著者
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TAKAI Yoshiaki
Department of Electronics Engineering, Nagoya University
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ICHINOSE Ataru
Electrical Physics Department, Komae Research Laboratory, Central Research Institute of Electric Pow
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MUKAIDA Masashi
Department of Electrical and Information Engineering, Yamagata University
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Ichino Yusuke
Department Of Electronics Nagoya University
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MIURA Masashi
Department of Electrical Engineering and Computer Science, Nagoya University
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OZAKI Toshinori
Department of Electrical Engineering and Computer Science, Nagoya University
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Matsumoto Kaname
Department Of Materials Science And Engineering Kyushu Institute Of Technology
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Horii Shigeru
Department Of Applied Chemistry School Of Engineering University Of Tokyo
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Yoshida Yutaka
Deparlment Of Internal Medicine School Of Medicine Kobe University
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Mukaida Masashi
Department of Materials Science and Engineering, Kyushu University, 6-10-1 Hakozaki, Higashi-ku, Fukuoka 812-8581, Japan
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Takai Yoshiaki
Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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Ichinose Ataru
Electric Power Engineering Research Laboratory, Central Research Institute of Electric Power Industry
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Ichinose Ataru
Electric Power Engineering Research Laboratory, Central Research Institute of Electric Power Industry, 2-6-1 Nagasaka, Yokosuka, Kanagawa 240-0196, Japan
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Horii Shigeru
Department of Applied Chemistry, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8586, Japan
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Ozaki Toshinori
Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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Miura Masashi
Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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Ichino Yusuke
Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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Miura Masashi
Department of Applied Chemistry, Faculty of Engineering, Nagoya University
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