Characteristics of Interface-Modified Josephson Junctions Fabricated under Various Etching Conditions

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2000-04-01

著者

• HAYAKAWA Hisao

  Department of Electronics Engineering, Nagoya University

• Yoshida K

  Department Of Chemistry Graduate School Of Science Osaka University

• Yamaguchi K

  Osaka Univ. Osaka

• 吉田 起國

  京大院エネルギー科学

• 吉田 起國

  京大原子エネルギー研

• 吉田 起國

  京大原研

• YOSHIDA Kazuhiro

  Department of Surgical Oncology, Gifu University

• Fujimaki Akira

  Department Of Quantum Engineering Nagoya University

• Fujimaki Akira

  The Department Of Quantum Engineering Faculty Of Engineering Nagoya University

• Yoshida K

  Nagoya Univ. Nagoya Jpn

• Fujimaki A

  Nagoya Univ. Nagoya‐shi Jpn

• Fujimaki Akira

  Nagoya Univ. Nagoya Jpn

• Matsuda Gen-ichiro

  Department Of Quantum Engineering Nagoya University

• Yamada K

  Department Of Physics Tohoku University

• HORIBE Masahiro

  ISTEC

• HORIBE Masahiro

  Department of Quantum Engineering, Nagoya University

• INAGAKI Yukitoshi

  Department of Quantum Engineering, Nagoya University

• HAYASHI Noriyoshi

  Department of Quantum Engineering, Nagoya University

• 吉田 起國

  Graduate School Of Engineering Osaka University

• 早川 尚男

  京都大学大学院人間・環境学研究科

• Kishi Yasuo

  Functional Materials Research Center Sanyo Electric Co. Ltd.

• Yoshida Kazuhiro

  Department Of Biotechnology Graduate School Of Engineering Nagoya University

• Horibe Masahiro

  Department Of Electronics Faculty Of Engineering Nagoya Universtty

• Inagaki Yukitoshi

  Department Of Quantum Engineering Nagoya University

• Hayashi Noriyoshi

  Department Of Quantum Engineering Nagoya University

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