n-Type Control by Sulfur Ion Implantation in Homoepitaxial Diamond Films Grown by Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-12-15
著者
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Yamanaka Sadanori
Nanotechnology Research Institute National Institute Of Advanced Industrial Science And Technology (
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YAMANAKA Shoji
Faculty of Engineering,Hiroshima University
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KOBAYASHI Naoto
Electrotechnical Laboratory
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WATANABE Hideyuki
Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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OKUSHI Hideyo
Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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OKUSHI Hideyo
Electrotechnical Laboratory
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KAJIMURA Koji
Electrotechnical Laboratory, Tsukuba Research Center
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Watanabe Hirohito
Institute Of Material Science University Of Tsukuba
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Watanabe H
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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HASEGAWA Masataka
Electrotechnical Laboratory
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TAKEUCHI Daisuke
Electrotechnical Laboratory
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YAMANAKA Sadanori
Electrotechnical Laboratory
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OGURA Masahiko
Electrotechnical Laboratory
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WATANABE Hideyuki
Electrotechnical Laboratory
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Watanabe H
Semiconductor Leading Edge Technol. Inc. Yokohama Jpn
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WATANABE Hajime
ULSI Laboratory, Mitsubishi Electric Corporation
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Kajimura K
Electrotechnical Laboratory
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Ogura M
Jst‐crest Ibaraki Jpn
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Kajimura Koji
Electrotechnical Laboratory
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Okushi H
Electrotechnical Lab. Ibaraki Jpn
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Okushi Hideyo
Energy Technology Research Institute National Institute Of Advanced Industrial Science And Technolog
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Tachiki Minoru
School Of Science And Engineering:crest Jst (japan Science And Technology Corporation)
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Ogura Masahiko
Energy Technology Research Institute National Institute Of Advanced Industrial Science And Technolog
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Takeuchi Daisuke
Energy Technology Research Institute National Institute Of Advanced Industrial Science And Technolog
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Tachiki M
Energy Technology Research Institute National Institute Of Advanced Industrial Science And Technolog
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Taniuchi Hirotada
School Of Science And Engineering Waseda University
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Watanabe Hideo
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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