Deposition of Ge_<1-x>C_x Alloy on Si by Combined Low-Energy Ion Beam and Molecular Beam Epitaxial Method

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1999-06-15

著者

• 山田 晃

  東京農工大学生物システム応用科学府

• Fons P

  Optoelectronic Materials And Devices Group Photonics Research Institute National Institute Of Advanc

• Shibata H

  Toshiba Corp. Yokohama Jpn

• Shibata Hajime

  Electrotechnical Laboratory

• KIMURA Shinji

  Electrotechnical Laboratory

• FONS Paul

  Electrotechnical Laboratory

• YAMADA Akimasa

  Electrotechnical Laboratory

• OBARA Akira

  Electrotechnical Laboratory

• KOBAYASHI Naoto

  Electrotechnical Laboratory

• Fons P

  National Inst. Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn

• Shibata H

  Electrotechnical Lab. Ibaraki Jpn

• Shibata Hiroyuki

  Ntt Basic Research Laboratories

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