Nanometer-Scale Direct Carbon Mask Fabrication Usirng Electron-Beam-Assisted Deposition

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1993-12-30

著者

• Fujita J

  Crest-jst

• MANAKO Shoko

  Fundamental Res. Labs., NEC Corporation

• FUJITA Jun-ichi

  Fundamental Res. Labs., NEC Corporation

• OCHIAI Yukinori

  Fundamental Res. Labs., NEC Corporation

• MATSUI Shinji

  Fundamental Res. Labs., NEC Corporation

• WATANABE Hideyuki

  Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST)

• Watanabe Hirohito

  Institute Of Material Science University Of Tsukuba

• Watanabe H

  Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)

• Watanabe H

  Semiconductor Leading Edge Technol. Inc. Yokohama Jpn

• WATANABE Hajime

  ULSI Laboratory, Mitsubishi Electric Corporation

• WATANABE Heiji

  Fundamental Research Laboratories, NEC Corporation

• BABA Masakazu

  Fundamental Research Laboratories, NEC Corporation

• Baba M

  Institute For Solid State Physics University Of Tokyo

• Manaka Susumu

  Fundamental Research Laboratories Nec Corporation

• Baba Masakazu

  Fundamental Research Laboratories Nec Corporation

• Baba Masakazu

  Ntt Information And Communication Systems Laboratories

• Watanabe Heiji

  Fundamental Research Laboratories Nec Corporation

• Watanabe Hideo

  Department Of Electronic Engineering Faculty Of Engineering Tohoku University

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