Fujita J | Crest-jst
スポンサーリンク
概要
関連著者
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Fujita J
Crest-jst
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Manaka Susumu
Fundamental Research Laboratories Nec Corporation
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OCHIAI Yukinori
Fundamental Res. Labs., NEC Corporation
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FUJITA Jun-ichi
Fundamental Res. Labs., NEC Corporation
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MATSUI Shinji
Fundamental Res. Labs., NEC Corporation
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Ishida M
Sii Nanotechnology Inc.
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Ichikawa Masakazu
Joint Research Center For Atom Technology
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Ichikawa Masakazu
Joint Research Center For Atom Technology Angstrom Technology Partnership
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Ichikawa Masakazu
Joint Research Center For Atom Technology Angstrom Technology Partnership (jrcat-atp) C
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Ichikawa Mitsuru
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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MANAKO Shoko
Fundamental Res. Labs., NEC Corporation
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IWASA Masayuki
SII Nanotechnology Inc.
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Iwasa Masayuki
Sii Nanotechnology Inc. Tokyo Jpn
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Nomura E
Nec Corp. Ibaraki Jpn
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Nomura Eiichi
Fundamental Research Laboratories Nec Corporation
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Nomura Eiichi
Fundamental Research Labs Nec Corporation
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FUJITA Junji
National Institute for Fusion Science
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SAKAMOTO Tetsuo
Institute of Industrial Science, The University of Tokyo
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Sakamoto Toshitugu
Faculty Of Engineering Science Osaka University
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Shiokawa Takao
Semiconductor Laboratory Riken The Institute For Physical And Chemical Research
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Sakamoto T
Department Of Communication Engineering Faculty Of Computer Science And System Engineering Okayama P
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SASAO Mamiko
National Insitute for Fusion Science
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ISHIDA Masahiko
NEC Fundamental and Environmental Research Laboratories
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OCHIAI Yukinori
NEC Fundamental and Environmental Research Laboratories
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Wada Motoi
Department Of Electronics Doshisha University
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Wada Motoi
Department Of Elctronics Doshisha University
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Fujita Jun-ichi
Nec Fundamental Research Laboratories
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Wada M
Department Of Electronics Doshisha University
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Sasao M
National Institute For Fusion Science
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Sasao Mamiko
National Institute For Fusion Science
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SAKAMOTO Toshitsugu
Fundamental Research Laboratories, NEC Corporation
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YAMAOKA Hitoshi
RIKEN (The Institute of Physical and Chemical Research)
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WATANABE Hideyuki
Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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Yamaoka H
Inst. Physical And Chemical Res. (riken) Hyogo Jpn
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Watanabe Hirohito
Institute Of Material Science University Of Tsukuba
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Watanabe H
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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Watanabe H
Semiconductor Leading Edge Technol. Inc. Yokohama Jpn
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KAITO Takashi
Seiko Instruments Inc.
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Wada Morio
Optical Measurement Technology Development Co. Ltd.
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WATANABE Hajime
ULSI Laboratory, Mitsubishi Electric Corporation
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Wada M
Miyanodai Technology Development Center Fuji Photo Film Co. Ltd.
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Sakamoto Toshitsugu
Fundamental Research Laboratories Nec Corporation
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Watanabe Hideo
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Sakamoto Toshitsugu
Fundamental and Environmental Research Labs., NEC Corp., Tsukuba, Ibaraki 305-8501, Japan
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YAMAOKA Hitoshi
The Institute of Physical and Chemical Research
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KAITO Takashi
SII NanoTechnology Inc.
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FUJITA Jun-ichi
CREST JST, Japan Science and Technology Co.
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ISHIDA Masahiko
CREST JST, Japan Science and Technology Co.
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OCHIAI Yukinori
CREST JST, Japan Science and Technology Co.
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OKABE Yushirou
National Institute for Fusion Science
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WATANABE Heiji
Joint Research Center for Atom Technology, Angstrom Technology Partnership (JRCAT-ATP), c
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ICHIKAWA Masakazu
Joint Research Center for Atom Technology, Angstrom Technology Partnership (JRCAT-ATP), c
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BABA Toshio
Fundamental Research Laboratories, NEC Corporation
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KAWAURA Hisao
Fundamental and Environmental Research Laboratories, NEC Corporation
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Ochiai Yukinori
System Devices And Fundamental Research Nec Corporation
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Baba T
Fundamental Research Laboratories Nec Corporation:(present Office)silicon System Laboratories Nec Co
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Baba Toshio
Fundamental And Environmental Research Laboratories Nec Corporation
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Kawaura H
Fundamental Research Laboratories Nec Caporation
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Watanabe Heiji
Joint Research Center For Atom Technology Angstrom Technology Partnership (jrcat-atp)
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Fujita Jun-ichi
CREST JST, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Japan
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Ishida Masahiko
CREST JST, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Japan
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KAITO Takashi
SII Nano Technology Inc.
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Tong X‐m
Riken (the Institute Of Physical And Chemical Research)
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Tong Xiao-min
Riken
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Kobayashi K
Dep. Of Electronic Sci. And Engineering Kyoto Univ. Katsura Nishikyo Kyoto 615-8510 Japaninnovative
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Kometani Reo
Graduate School Of Engineering University Of Tokyo
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Kometani Reo
Univ. Tokyoi Tokyo Jpn
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Hiroshima H
National Inst. Of Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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NAMATSU Hideo
NTT Basic Research Laboratories
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Kanda Kazuhiro
Graduate School Of Science Laboratory Of Advanced Science And Technology For Industry (lasti) Univer
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Kanda Kazuhiro
University Of Hyogo Laboratory Of Advanced Science And Technology For Industry
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Hoshino Takayuki
Crest Japan Science And Technology Co. (jst)
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OHNISHI Yoshitake
Fundamental Research Laboratories, NEC Corporation
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KOMETANI Reo
University of Hyogo, Graduate School of Science, LASTI
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KONDO Kazushige
CREST JST, Japan Science and Technology Co.
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HARUYAMA Yuichi
University of Hyogo, Graduate School of Science, LASTI
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MATSUI Shinji
University of Hyogo, Graduate School of Science, LASTI
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MATSUI Shinji
Himeji Institute of Technology, Graduate School of Science, LASTI
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TANIGAKI Katsumi
Fundamental Research Laboratories, NEC Corporation
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Haruyama Y
Graduate School Of Science Laboratory Of Advanced Science And Technology For Industry (lasti) Univer
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Haruyama Yuichi
Uvsor Facility Institute For Molecular Science:(present Address)laboratory Of Advanced Science And T
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Haruyama Yuichi
Institute Of Physics University Of Tsukuba
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Tong Xiao-min
Cold Trapped Ion Project Japan Science & Technology Cooperation
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Morita Takahiko
Crest-jst
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OKADA Satoshi
CREST-JST
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MUKAWA Takahito
CREST-JST
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KOBAYASHI Ryota
CREST-JST
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MATSUI Shinji
CREST-JST
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KOMURO Masanori
Advanced Semiconductor Research Center, AIST
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SAKAMOTO Toshitsugu
NEC Fundamental Research Laboratories
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ICHIHASHI Toshinari
NEC Fundamental Research Laboratories
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Tanigaki Katsumi
Fundamental Research Laboratories Nec Corporation:(present Address) Department Of Material Science F
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Ishigaki Hiroyuki
Laboratory Of Advanced Science And Technology Himeji Institute Of Technology
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WATANABE Heiji
Fundamental Research Laboratories, NEC Corporation
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BABA Masakazu
Fundamental Research Laboratories, NEC Corporation
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MATSUI Shinji
Laboratory of Advanced Science and Technology for Industry, Himeji Institute of Technology
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Baba M
Institute For Solid State Physics University Of Tokyo
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Baba Masakazu
Fundamental Research Laboratories Nec Corporation
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Baba Masakazu
Ntt Information And Communication Systems Laboratories
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Matsui S
Graduate School Of Science Laboratory Of Advanced Science And Technology For Industry (lasti) Univer
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Namatsu H
Ntt Basic Res. Lab. Kanagawa Jpn
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Komuro M
Mirai Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Scienc
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Watanabe Heiji
Fundamental Research Laboratories Nec Corporation
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IGAKU Yutaka
Laboratory of Advanced Science and Technology, Himeji Institute of Technology
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HIROSHIMA Hiroshi
Advanced Semiconductor Research Center; AIST
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Kanda K
Himeji Institute Of Technology Graduate School Of Science Lasti
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Igaku Yutaka
Laboratory Of Advanced Science And Technology Himeji Institute Of Technology
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KOBAYASHI Kenji
NEC Fundamental Research Laboratories
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YAMAMOTO Hiromasa
Tsukuba Research Laboratories
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TONO Seiji
Tsukuba Research Laboratories
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Matsuura K
Daido Institute Of Technology
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Hoshino Takayuki
Crest Jst Japan Science And Technology Co.
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Yamamoto H
Tsukuba Research Laboratories
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Matsui Shinji
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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MATSUURA Kiyokata
Daido Institute of Technology
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SAKATA Masataka
Daido Institute of Technology
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FUJIWAKA Setsuya
Takasago Industry Co., Ltd.
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SAMOTO Norihiko
Kansai Electronics Research Laboratories, NEC Corporation
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Fujiwaka S
Takasago Industry Co. Ltd.
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Matsui Shinji
Laboratory Of Advanced Science And Technology For Industry (lasti) Graduate School Of Science Univer
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Ohnishi Yoshitake
Fundamental Research Laboratories Nec Corporation
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Ichihashi T
Nec Fundamental Research Laboratories
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Samoto Norihiko
Kansai Electronics Research Laboratories Nec Corporation
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Matsui Shinji
University Of Hyogo
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Matsui Shinji
Laboratory Of Advanced Science And Technolgy For Industory Himeji Institute Of Technology
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Hoshino Takayuki
Graduate School Of Bio-application And System Engineering Tokyo University Of Agriculture And Technology
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松浦 清剛
Daido Institute of Technology
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Haruyama Yuichi
University of Hyogo, Graduate School of Science, Laboratory of Advanced Science and Technology for Industry (LASTI), 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Kobayashi Ryota
CREST JST, Japan Science and Technology Co., 4-1-8, Hon-cho, Kawaguchi, Saitama 332-0012, Japan
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Kaito Takashi
SII Nano Technology Inc., 36-1 Takenoshita, Oyama, Shizuoka 410-1393, Japan
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Matsui Shinji
CREST JST, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Japan
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Okada Satoshi
CREST JST, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Japan
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Mukawa Takahito
CREST JST, Japan Science and Technology Co., 4-1-8, Hon-cho, Kawaguchi, Saitama 332-0012, Japan
著作論文
- Nanometer-Scale Patterning of Polystyrene Resists in Low-Voltage Electron Beam Lithography
- Calixarene Electron Beam Resist for Nano-Lithography
- Resolution-Limit Study of Chain-Structure Negative Resist by Electron Beam Lithography
- Fabrication of Nanomanipulator with SiO_2/DLC Heterostructure by Focused-Ion-Beam Chemical Vapor Deposition
- Direct Extraction of Sodium Negative Ions from Sodium Plasma
- Energy Distribution of Au^- Ions Produced by Sputtering
- Dependence of Au^- Production upon the Target Work Function in a Plasma-Sputter-Type Negative Ion Source
- Sub-10-nm Electron Beam Lithography Using a Poly(α-methylstyrene) Resist with a Molecular Weight of 650
- Comparison of Young's Modulus Dependency on Beam Accelerating Voltage between Electron-Beam- and Focused Ion-Beam-Induced Chemical Vapor Deposition Pillars
- Structure and Resonant Characteristics of Amorphous Carbon Pillars Grown by Focused-Ion-Beam-Induced Chemical Vapor Deposition
- Self-Developing Properties of an Inorganic Electron Beam Resist and Nanometer-Scale Patterning Using a Scanning Electron Beam
- Electron-Stimulated Desorption and in situ Scanning Electron Microscopy Study on Self-Developing Reaction of High-Resolution Inorganic Electron Beam Resist
- Nanometer-Scale Direct Carbon Mask Fabrication Usirng Electron-Beam-Assisted Deposition
- Room Temperature Nanoimprint Technology Using Hydrogen Silsequjoxane (HSQ)
- Investigating Line-Edge Roughness in Calixarene Fine Patterns Using Fourier Analysis
- Fabrication and Characterization of 14-nm-Gate-Length EJ-MOSFETs
- Proposal of Pseudo Source and Drain MOSFETs for Evaluating 10-nm Gate MOSFETs
- A Proposal of a Hybrid Magnetic Probe
- Nanolithography Using a Chemically Amplified Negative Resist by Electron Beam Exposure