WATANABE Heiji | Fundamental Research Laboratories, NEC Corporation
スポンサーリンク
概要
関連著者
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WATANABE Heiji
Fundamental Research Laboratories, NEC Corporation
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Watanabe Heiji
Fundamental Research Laboratories Nec Corporation
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MATSUI Shinji
Fundamental Res. Labs., NEC Corporation
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OCHIAI Yukinori
Fundamental Res. Labs., NEC Corporation
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WATANABE Hideyuki
Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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ICHIKAWA Masakazu
Joint Research Center for Atom Technology, Angstrom Technology Partnership (JRCAT-ATP), c
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Watanabe Hirohito
Institute Of Material Science University Of Tsukuba
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Watanabe H
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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BABA Toshio
Fundamental Research Laboratories, NEC Corporation
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Watanabe H
Semiconductor Leading Edge Technol. Inc. Yokohama Jpn
著作論文
- Nanometer-Scale Direct Carbon Mask Fabrication Usirng Electron-Beam-Assisted Deposition
- Mechanism of Layer-by-Layer Oxidation of Si(001)Surfaces by Two-Dimensional Oxide-Island Nucleation at SiO_2/Si Interfaces
- Mechanism of Layer-by-Layer Oxidation of Si (001) Surfaces Proceeding by Two-Dimensional Oxide-Island Nucleation at SiO_2/Si Interfaces
- Reverse Dry Etching Using a High-Selectivity Carbon Mask Formed by Electron Beam Deposition
- GaAs Dry Etching Using Electron Beam Induced Surface Reaction
- Novel Process for Visible Light Emission from Si Prepared by Ion Irradiation