Kimura Shigeru | Microelectronics Research Laboratories Nec Corporation
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概要
関連著者
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Kimura Shigeru
Microelectronics Research Laboratories Nec Corporation
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KIMURA Shigeru
Microelectronics Research Laboratories, NEC Corporation
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Ono Haruhiko
Microelectronics Research Laboratories Nec Corporation
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OCHIAI Yukinori
Fundamental Res. Labs., NEC Corporation
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MATSUI Shinji
Fundamental Res. Labs., NEC Corporation
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WATANABE Hideyuki
Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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Watanabe Hirohito
Institute Of Material Science University Of Tsukuba
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Ikeda Kazuko
Ulsi Device Development Laboratories Nec Corporation
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Watanabe H
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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Watanabe H
Semiconductor Leading Edge Technol. Inc. Yokohama Jpn
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Kitano Tomohisa
Ulsi Device Development Laboratories Nec Corporation
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Ishikawa Tetsuya
Department Of Applied Physics Faculty Of Engineering University Of Tokyo
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ICHIHASHI Toshinari
NEC Fundamental Research Laboratories
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Mochizuki Yasunori
Fundamental Research Laboratories Nec Corporation
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Mochizuki Yasunori
Fundamental Research Laboratories Nec Coeporation
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WATANABE Heiji
Fundamental Research Laboratories, NEC Corporation
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Manaka Susumu
Fundamental Research Laboratories Nec Corporation
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Hasegawa Eiji
Ulsi Device Development Division Nec Corporation
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Saito Shuichi
Ulsi Device Development Laboratories Nec Corporation
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Ikarashi Taeko
Microelectronics Research Laboratories Nec Corporation
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Akimoto Koichi
Microelectronics Research Laboratories Nec Corporation
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Watanabe Heiji
Fundamental Research Laboratories Nec Corporation
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ICHIHASHI Toshinari
Fundamental Research Laboratories, NEC Corporation
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Ookubo N
Nec Corp. Kanagawa Jpn
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TSUKIJI Masaru
ULSI Device Development Laboratories, NEC Corporation
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Ogura Atsushi
Microelectronics Research Laboratories Nec Corporation
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OOKUBO Norio
Fundamental Research Laboratories, NEC Corporation
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Ichihashi T
Nec Fundamental Research Laboratories
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Ishikawa Tetsuya
Department Of Applied Physics University Of Tokyo
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Ichihashi Toshinari
Fundamental Research Laboratories Nec Corporation
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Ishikawa Tetsuya
Department Of Applied Chemistry Faculty Of Science Science University Of Tokyo
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SAITO Shuichi
ULSI Device Development Laboratories, NEC Corporation
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HASEGAWA Eiji
ULSI Device Development Laboratories, NEC Corporation
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Ichihashi Toshinari
Fundamental and Environmental Research Laboratories, NEC Corporation, 34 Miyukigaoka, Tsukuba, Ibaraki 305-8501, Japan
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IKEDA Kazuko
ULSI Device Development Laboratories, NEC Corporation
著作論文
- Silicon Surface Imperfection Probed with a Novel X-Ray Diffraction Technique and Its Influence on the Reliability of Thermally Grown Silicon Oxide
- Novel Process for Visible Light Emission from Si Prepared by Ion Irradiation
- Minute Strain Fields due to Vacancy Type Defects in a Rapidly Cooled Czochralski-Grown Silicon Crystal
- Precise Measurement of Strain in SOI Induced by Local Oxidation