Hasegawa Eiji | Ulsi Device Development Division Nec Corporation
スポンサーリンク
概要
関連著者
-
Hasegawa Eiji
Ulsi Device Development Division Nec Corporation
-
Ikeda Kazuko
Ulsi Device Development Laboratories Nec Corporation
-
Kitano Tomohisa
Ulsi Device Development Laboratories Nec Corporation
-
Saito Shuichi
Ulsi Device Development Laboratories Nec Corporation
-
Miura Yoshinao
Silicon Systems Research Laboratories System Devices And Fundamental Research Nec Corporation
-
Fujieda Shinji
Silicon Systems Research Laboratories Nec Corporation
-
Akimoto Koichi
Microelectronics Research Laboratories Nec Corporation
-
TSUKIJI Masaru
ULSI Device Development Laboratories, NEC Corporation
-
KIMURA Shigeru
Microelectronics Research Laboratories, NEC Corporation
-
Kimura Shigeru
Microelectronics Research Laboratories Nec Corporation
-
SAITO Shuichi
ULSI Device Development Laboratories, NEC Corporation
-
HASEGAWA Eiji
ULSI Device Development Laboratories, NEC Corporation
-
Fujieda Shinji
Silicon Systems Research Laboratories, System Devices and Fundamental Research, NEC Corporation
-
Miura Yoshinao
Silicon Systems Research Laboratories, System Devices and Fundamental Research, NEC Corporation
-
IKEDA Kazuko
ULSI Device Development Laboratories, NEC Corporation
著作論文
- Paramagnetic Defects Related to Positive Charges in Silicon Oxynitride Films
- Silicon Surface Imperfection Probed with a Novel X-Ray Diffraction Technique and Its Influence on the Reliability of Thermally Grown Silicon Oxide