Ichihashi Toshinari | Fundamental Research Laboratories Nec Corporation
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概要
関連著者
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Ichihashi Toshinari
Fundamental Research Laboratories Nec Corporation
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Ichihashi Toshinari
Fundamental and Environmental Research Laboratories, NEC Corporation, 34 Miyukigaoka, Tsukuba, Ibaraki 305-8501, Japan
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ICHIHASHI Toshinari
NEC Fundamental Research Laboratories
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Ichihashi T
Nec Fundamental Research Laboratories
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Kubo Yoshimi
Fundamental Res. Labs. Nec Corp.
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Iijima S
Fundamental Research Laboratories Nec Corporation
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Iijima Sumio
Fundamental Research Laboratories Nec Corporation
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ICHIHASHI Toshinari
Fundamental Research Laboratories, NEC Corporation
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Tabuchi J
Fundamental Research Laboratories Nec Corporation
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Tabuchi Junji
Fundamental Research Laboratories Nec Corporation
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SHIMAKAWA Yuichi
Fundamental Research Laboratories, NEC Corporation
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OCHIAI Yukinori
Fundamental Res. Labs., NEC Corporation
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MATSUI Shinji
Fundamental Res. Labs., NEC Corporation
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WATANABE Hideyuki
Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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Shimakawa Y
Nec Corp. Ibaraki Jpn
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Shimakawa Yuichi
Fundamental Res. Labs. Nec Corp.
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Watanabe Hirohito
Institute Of Material Science University Of Tsukuba
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SUZUKI Tohru
Opto-Electronics Research Laboratories, NEC Corporation
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Gomyo Akiko
Fundamental And Environmental Research Laboratories Nec Corporation
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Watanabe H
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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NISHI Kenichi
Opto-electronics Research Laboratories, NEC Corporation
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Watanabe H
Semiconductor Leading Edge Technol. Inc. Yokohama Jpn
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Kurihara Kaori
Opto-Electronics Research Laboratories, NEC Corporation
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Mochizuki Yasunori
Fundamental Research Laboratories Nec Corporation
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Mochizuki Yasunori
Fundamental Research Laboratories Nec Coeporation
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WATANABE Heiji
Fundamental Research Laboratories, NEC Corporation
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Ono Haruhiko
Microelectronics Research Laboratories Nec Corporation
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Manaka Susumu
Fundamental Research Laboratories Nec Corporation
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Watanabe Heiji
Fundamental Research Laboratories Nec Corporation
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Kurihara Kaori
Opto-electronics And High-frequency Device Research Laboratories Nec Corporation
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Ookubo N
Nec Corp. Kanagawa Jpn
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OHKOUCHI Shunsuke
Photonic and Wireless Devices Research Laboratories, NEC Corporation
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FURUHASHI Takahisa
Department of Materials Science & Engineering, Tokyo Institute of Technology
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KIMURA Shigeru
Microelectronics Research Laboratories, NEC Corporation
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Nishi Kenichi
Opto-electronics And High-frequency Device Research Laboratories Nec Corporation
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OOKUBO Norio
Fundamental Research Laboratories, NEC Corporation
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Hsu Chung-chi
Department Of Electronic Engineering The Chinese University Of Hong Kong
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Kimura Shigeru
Microelectronics Research Laboratories Nec Corporation
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Suzuki Tohru
Photonics And Wireless Devices Research Laboratories Nec Corporation
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Suzuki Tohru
Opto-electronics And High-frequency Device Research Laboratories Nec Corporation
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Ohkouchi Shunsuke
Photonic and Wireless Devices Research Laboratories, NEC Corporation, 34 Miyukigaoka, Tsukuba, Ibaraki 305-8501, Japan
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Furuhashi Takahisa
Department of Materials Science & Engineering, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama, Kanagawa 226-8502, Japan
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Hsu Chung-Chi
Department of Electronic Engineering, The Chinese University of Hong Kong, Shatin, N.T., Hong Kong, China
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Suzuki Tohru
Photonic and Wireless Devices Research Laboratories, NEC Corporation, 34 Miyukigaoka, Tsukuba, Ibaraki 305-8501, Japan
著作論文
- Observation of Triple-Period-A Type Atomic Ordering in Sb-Doped Ga_In_P Alloys
- Novel Process for Visible Light Emission from Si Prepared by Ion Irradiation
- "Incipient Orthorhombic" Phase in Ba_2YCu_3O_ Ctystals : Electrical Properties of Condensed Matter
- Orthorhombic-II Phase in Ba_2YCu_3O_ Crystals : Electrical Properties of Condensed Matter
- Incipient Twinning in Ba_2YCu_3O_ Crystals
- Crystal Growth Faults in Superconductor Tl-Ba-Ca-Cu-O Oxide Crystals : Condensed Matter
- In Situ Observation of Oxidation and Etching of Silicon by Ultra-High-Vacuum Transmission Electron Microscopy
- Atomic Arrangement in a Triple-period A-type Ordered GaInP Layer Grown with Sb Addition during Metal Organic Vapor Phase Epitaxy Observed by Cross Sectional Scanning Tunneling Microscope