Ichikawa Masakazu | Joint Research Center For Atom Technology

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概要

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著作論文

Room Temperature Nanoimprinting Using Release-Agent Spray-Coated Hydrogen Silsesquioxane
Amorphous-to-Polycrystalline Silicon Transition in Hot Wire Cell Method
Fabrication of Nanomanipulator with SiO_2/DLC Heterostructure by Focused-Ion-Beam Chemical Vapor Deposition
Characteristics of Nano-Electrostatic Actuator Fabricated by Focused Ion Beam Chemical Vapor Deposition
Electron-Beam-Induced Selective Thermal Decomposition of Ultrathin SiO_2 Layers Used in Nanofabrication
Comparison of Young's Modulus Dependency on Beam Accelerating Voltage between Electron-Beam- and Focused Ion-Beam-Induced Chemical Vapor Deposition Pillars
Growth Manner and Mechanical Characteristics of Amorphous Carbon Nanopillars Grown by Electron-Beam-Induced Chemical Vapor Deposition
Position-Controlled Carbon Fiber Growth Catalyzed Using Electron Beam-Induced Chemical Vapor Deposition Ferrocene Nanopillars
Three-Dimensional Nanoimprint Mold Fabrication by Focused-Ion-Beam Chemical Vapor Deposition
Structure and Resonant Characteristics of Amorphous Carbon Pillars Grown by Focused-Ion-Beam-Induced Chemical Vapor Deposition
Spectral Characteristics of Thin-Film Stacked-Tandem Solar Modules
Self-Developing Properties of an Inorganic Electron Beam Resist and Nanometer-Scale Patterning Using a Scanning Electron Beam
Electron-Stimulated Desorption and in situ Scanning Electron Microscopy Study on Self-Developing Reaction of High-Resolution Inorganic Electron Beam Resist
Observation and nucleation control of Ge nanoislands on Si(111) surfaces using scanning reflection electron microscopy
Layer-by-Layer Oxidation of Si(001) Surfaces
High Deposition Rate of Polycrystalline Silicon Thin Films Prepared by Hot Wire Cell Method
Electrical Characterization of Atomic-Scale Defects in an Ultrathin Si Oxynitride Layer
A Fabrication of Very Low Contact Resistance AIGaN/GaN Heterojunction Field-Effect Transistor Using Selective Area Growth Technique by Gas-Source Molecular Beam Epitaxy : Optics and Quantum Electronics
Diffusion Constants of Si Adsorbates on a Si(001) Surface
Observation of Si(001) Surface Domains in Absorption Current Images of an Electron Microscope
Observation of 1-nm-High Structures on a Si (001) Surface Using a Differential Interference Optical Microscope
Room Temperature Nanoimprint Technology Using Hydrogen Silsequjoxane (HSQ)
Anisotropic Diffusion of Si Adsorbates on a Si (001) Surface
Direct Observation of Electron Charge of Si Atoms on a Si(001) Surface
Scanning Tunneling Microscopy Study of Hf Silicate Formed by Ulttrathin Hf Metal on SiO_2 : Effect of Hf/SiO_2 Thickness Ratio
Evaluation of fluorinated diamond like carbon as antisticking layer by scanning probe microscopy
Sub-10-nm-Scale Lithography Using p-chloromethyl-methoxy-calix[4]arene Resist
Investigating Line-Edge Roughness in Calixarene Fine Patterns Using Fourier Analysis
Mechanism of Layer-by-Layer Oxidation of Si(001)Surfaces by Two-Dimensional Oxide-Island Nucleation at SiO_2/Si Interfaces
Mechanism of Layer-by-Layer Oxidation of Si (001) Surfaces Proceeding by Two-Dimensional Oxide-Island Nucleation at SiO_2/Si Interfaces
Electrical Characterization of Atomic-Scale Defects in an Ultrathin Si Oxynitride Layer
Atomic-Scale Structure of SiO_2/Si(001) Interface Formed by Furnace Oxidation
Electron-beam Initiated Transfer of Ge from Ge Islands on SiO2 Surfaces to the Tip of a Scanning Tunneling Microscope

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