Komeya Katutoshi | Graduate School Of Environment And Information Science Yokohama National University
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概要
関連著者
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Komeya Katutoshi
Graduate School Of Environment And Information Science Yokohama National University
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Kondo K
Fujitsu Laboratories Ltd.
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Kondo Kazuhiro
Fujitsu Laboratories Ltd.
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Kondo K
Tokyo Inst. Technol. Yokohama Jpn
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Kondo K
Stanley Electric Co. Ltd. Yokohama Jpn
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Komeya K
Graduate School Of Environment And Information Sciences Yokohama National Univ.
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Kondo K
Kyoto Univ. Kyoto Jpn
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Meguro Takeshi
Graduate School Of Environment And Information Science Yokohama National University
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Meguro Takeshi
Graduate School Of Environment And Information Sciences Yokohama National Univ.
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Tatami Junichi
Department Of Artificial Environment And Information Faculty Of Environment And Information Sciences
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Meguro Takeshi
Department Of Artificial Environment And Information Faculty Of Environment And Information Sciences
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TATAMI Junichi
Graduate School of Environment and Information Science, Yokohama National University
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Wakihara Toru
Graduate School Of Environment And Information Sciences Yokohama National Univ.
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NAKAMURA Kazutaka
Materials and Structures Laboratory, Tokyo Institute of Technology
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KONDO Ken-ichi
Materials and Structures Laboratory, Tokyo Institute of Technology
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Ishikawa T
Riken Harima Institute
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Hiyamizu Satoshi
Fujitsu Limited
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Hiyamizu Satoshi
Fujitsu Laboratories Limited
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KOMEYA Katsutoshi
Graduate School of Environment and Information Science, Yokohama National University
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MEGURO Takeshi
Graduate School of Environment and Information Science, Yokohama National University
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KONDO Kazuo
Fujitsu Laboratories Ltd.
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ISHIKAWA Tomonori
Fujitsu Laboratories LTD.
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MATSUMURA Yoshihito
Department of Applied Physics､Faculty of Engineering, Tokai University
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UCHIDA Hirohisa
Department of Applied Physics､Faculty of Engineering, Tokai University
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HIYAMIZU Satoshi
Graduate School of Engineering Science, Osaka University
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KONDO Kazuhiro
Fujitsu Limited
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Ishikawa T
National Space Dev. Agency Of Japan Ibaraki Jpn
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HIRONAKA Yoichiro
Materials and Structures Laboratory, Tokyo Institute of Technology
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Saito J
Extreme Ultraviolet Lithography System Dev. Assoc. (euva) Kanagawa Jpn
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Saito Junji
Fujitsu Laboratories Limited
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NANBU Kazuo
Fujitsu Laboratories Ltd.
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MUKOH Akio
Hitachi Research Laboratory, Hitachi Ltd.
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Saito Junji
Fujitsu Laboratories Ltd.
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Nanbu Kazuo
Fujitsu Laboratories Limited
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Yoshida M
Functional Materials Research Laboratories Nec Corporation
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Yoshida M
Yoshida Semiconductor Lab. Fukuoka Jpn
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Saito J
New Business Development Department Nikon Corporation In Hitachi Maxell
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Saito Jun
Nikon Corp. New Business Development Department
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YOSHIDA Masayuki
Kyushu Institute of Design
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KURINO Tsunehisa
Society of Non-Traditional Technology(SNTT)
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YOSHIDA Masatake
National Institute of Advanced Industrial Science and technology (AIST) Tsukuba Central 5
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Yoshida Masatake
National Chemical Laboratory For Industry Tsukuba Research Center
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ISHIKAWA Hideaki
Fujitsu Laboratories Ltd.
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Ishikawa T
Fujitsu Laboratories Ltd.
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Hosoda Masahiro
Frontier Research Program The Institute Of Physical And Chemical Research (riken):(present Address)
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SATO Katsuaki
Faculty of Technology, Tokyo University of Agriculture and Technology
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MUTO Shunichi
Fujitsu Laboratories Ltd.
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SATO Kuninori
National Institute for Fusion Science
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Sato K
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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ONO Katsuji
Fujitsu Laboratories Ltd.
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Sato K
Asahi Glass Co. Ltd. Yokohama Jpn
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Nomura H
Toshiba Corp. Yokohama Jpn
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Sato K
Depertment Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Ono K
Univ. California Ca Usa
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Ono K
Univ. Tsukuba Ibaraki Jpn
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Kaneko H
The Society Of Non-traditional Technology
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Kaneko Hideo
Environmental Health Science Laboratory Sumitomo Chemical Co. Ltd.
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Sato K
Faculty Of Applied Biological Science Hiroshima University
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Kikuchi Y
Aset Super‐fine Sr Lithography Lab. Kanagawa Jpn
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Kikuchi Yukiko
Aset Super-fine Sr Lithography Laboratory Co Ntt Telecommnications Energy Laboratories
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Kikuchi Yukiko
Super-fine Sr Lithography Laboratory Association Of Super-advanced Electronics Technologies(aset) At
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Sato K
National Institute For Fusion Science
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SASABE Hiroyuki
Frontier Research Program, The Institute of Physical and Chemical Research(RIKEN)
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Hosoda M
Department Of Materials Science And Technology Faculty Of Engineering Gifu University
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Sato Katsuaki
Faculty Of Technology Tokyo University Of Agriculture & Techonology
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Ishikawa T
Kyushu Univ. Fukuoka Jpn
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SASA Shigehiko
Fujitsu Laboratories Ltd.
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Sato Kuninori
Institute For Fusion Science
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HARA Masahiko
Frontier Research Program, The Institute of Physical and Chemical Research (RIKEN)
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Kaneko H
Environmental Health Science Laboratory Sumitomo Chemical Co. Ltd.
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Sato K
National Defense Acad. Yokosuka Jpn
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Sato K
Faculty Of Technology Tokyo Universily Of Agriculture And Technology
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Muto S
Kek Ibaraki
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Sasaki K
Nagoya Univ. Nagoya Jpn
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Ishikawa Tetsuya
Riken Harima Institute
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Nakamura Shuji
Department Of Research And Development Nichia Chemical Industries Ltd.
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山田 晃
東京農工大学生物システム応用科学府
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内田 秀和
埼玉大学
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Yamada Akira
Frontier Research Program The Institute Of Physical And Chemical Research (riken)
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Kondo K
Hitachi Ltd. Ibaraki
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SHIBATOMI Akihiro
Fujitsu Limited
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KONDO Katsumi
Hitachi Research Laboratory, Hitachi Ltd.
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ISOGAI Masato
Hitachi Research Laboratory, Hitachi Ltd.
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KOMEYA Katsutoshi
Yokohama National University
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MEGURO Takeshi
Yokohama National University
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Ono K
Department Of Applied Chemistry The University Of Tokyo
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Ono K
Advanced Technology R&d Center Mitsubishi Electric Corporation:(present Address)department Of Ae
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Masu K
Research Institute Of Electrical Communication Tohoku University
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Masu Kazuya
Integrated Research Institute
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Masu Kazuya
Research Institute Of Electrical Communication Tohoku University
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Inoue T
Tohoku Univ. Sendai Jpn
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Kubota S
Sony Co. Atsugi‐shi Jpn
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Inoue T
Advanced Discrete Semiconductor Technology Laboratory Corporated Research And Development Center Tos
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Inoue Tatsuya
Materials And Components Research Laboratory Components And Devices Research Center Matsushita Elect
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Inoue Tetsushi
Research Laboratory Of Resources Utilization Tokyo Institute Of Technology
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Kikuchi Yukiko
Ulsi Research Center Toshiba Corporation
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Isogai M
Hitachi Research Laboratory Hitachi Ltd.
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Isogai Masato
Hitachi Research Laboratory Hitachi Lid.
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GOMEI Yoshio
ULSI Research Center, Toshiba Corporation
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Kubota S
Mitsubishi Electirc Corp. Hyogo Jpn
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Kubota Shigeo
Research Center Sony Corporation
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KONDO Ken-ichi
Tsukuba Research Laboratory, Stanley Electric Co., Ltd.
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NAKAMURA Susumu
Tsukuba Research Laboratory, Stanley Electric Co., Ltd.
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HIRASAWA Hiroshi
Stanley Electric Co., Ltd.
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Inoue Takahito
Electrotechnical Laboratory
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TSUBOUCHI Kazuo
Research Institute of Electrical Communication, Tohoku University
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Sano H
Murata Manufacturing Co. Ltd. Kyoto Jpn
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Masu Kazuya
東工大
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NOMURA Hiroshi
ULSI Research Laboratories, Toshiba Corporation
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KONDO Kenzo
ULSI Research Laboratories, Toshiba Corporation
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KOENINGER Veit
Department of Applied Physics, Faculty of Engineering, Tokai University
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Koeninger Veit
Department Of Applied Physics Faculty Of Engineering Tokai University
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UCHIDA Haru-Hisa
Department of Human Developments, Tokai University
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KIM Do
Department of Aqualife Medicine, College of Fisheries and Ocean Sciences, Chonnam National Universit
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Sato Masashi
Department of Applied Biological Science, Kagawa University
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HOTTA Mikinori
Graduate School of Environment and Information Science, Yokohama National University
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CHENG Yi-Bing
Department of Materials Engineering, Monash University
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YOKOYAMA Naoki
Fujitsu Laboratories Ltd.
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内田 秀和
埼玉大学大学院理工学研究科
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山本 雅彦
大阪大学 大学院工学研究科 マテリアル生産科学専攻
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山本 雅彦
Department Of Materials Science And Engineering Osaka University
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山本 雅彦
阪大工
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Watanabe Hiroshi
Graduate School of Frontier Sciences, The University of Tokyo
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MACKENZIE Kenneth
School of Physical and Chemical Sciences, Victoria University of Wellington
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Mackenzie Kenneth
School Of Chemical And Physical Sciences Victoria University Of Wellington
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Yamamoto Masanobu
Sony Corp. Tokyo Jpn
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SUGIYAMA Yoshihiro
Fujitsu Limited
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OHSHIMA Toshio
Fujitsu Laboratories Ltd.
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IMAMURA Kenichi
Fujitsu Laboratories Ltd.
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INATA Tsuguo
Fujitsu Laboratories Ltd.
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Sugiyama Y
Fujitsu Laboratories Ltd.
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Imamura K
Fujitsu Lab. Ltd. Kanagawa Jpn
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ISHIKAWA Itsuo
Faculty of Engineering, Yamanashi University
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SUGANOMATA Shinji
Faculty of Engineering, Yamanashi University
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Ishikawa Itsuo
Faculty Of Engineering Yamanashi University
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Ishikawa Itsuo
Faculty Engineering Yamanashi University
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Hashimoto Hisao
Fujitsu Limited
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Sugiyama Y
Jst‐crest Ibaraki Jpn
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NAKAMURA Tomohiro
Fujitsu Limited
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OHSHIMA Takeshi
Japan Atomic Energy Research Institute
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KITAMURA Teruo
Hitachi Research Laboratory, Hitachi Ltd.
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NAGAE Yoshiharu
Hitachi Research Laboratory, Hitachi Ltd.
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ERA Susumu
Hitachi Research Laboratory, Hitachi, Ltd.
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Yamamoto M
Ntt System Electrics Lab. Kanagawa Jpn
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Uchida H
Department Of Chemistry Faculty Of Science And Technology Sophia University
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Tatami Junichi
Yokohama National University
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SASAMOTO Tadashi
Kanagawa Institute of Technology, Department of Applied Chemistry
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Kaneko Hideo
Department Of Pediatrics Graduate School Of Medicine Gifu University
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Sasaki Shinya
Faculty Of Engineering Yamanashi University
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Azushima Akira
Graduate School Of Engineering Yokohama National University
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Hotta Mikinori
Inst. For Materials Res. Tohoku Univ.
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KONDO Kenji
Faculty of Engineering, Yamanashi University
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NAKATANI Yasuo
Faculty of Engineering, Yamanashi University
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MATSUMOTO Michio
Faculty of Engineering, Yamanashi University
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Era Susumu
Hitachi Research Laboratory Hitachi Ltd.
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Nagae Yoshiharu
Hitachi Research Laboratory Hitachi Ltd.
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Kondo Keiichi
Anan College Of Technology
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KATAYAMA Masahide
CRC Solutions Corp.
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NAKANO Hiromi
Electron Microscope Laboratory, Faculty of Science and Technology, Ryukoku University
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SAITO Fumikazu
Materials and Structure Laboratory, Tokyo Institute of Technology
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Yamamoto Yohei
Graduate School Of Environment And Information Sciences Yokohama National University
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CHEN I.-Wei
Department of Materials Science and Engineering, University of Pennsylvania
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KOMASTU Michiyasu
Toshiba Materials Co., Ltd.
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Suganomata S
Yamanashi Univ. Kofu Jpn
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Suganomata Shinji
Electrical Engineering Yananashi University
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Suganomata Shinji
Faculty Engineering Yamanashi University
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Kubota Shigeo
Kubota Techno
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Nishi Hidetoshi
Fujitsu Limited
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Kubota Shigeo
Kubota Opto-electronics Laboratory Core Technology Development Center Sony Corporation Core Technolo
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Wakabayashi Kunihiko
Materials And Structures Laboratory Tokyo Institute Of Technology
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SANO Hiroyuki
Stanley Electric Co., Ltd.
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NAKAMURA Susumu
Stanley Electric Co., Ltd.
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KONDO Kenichi
Stanley Electric Co., Ltd.
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SANO Hiroyuki
Tsukuba Research Laboratory, Stanley Electric Co., Ltd.
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HIRASAWA Hiroshi
Tsukuba Research Laboratory, Stanley Electric Co., Ltd.
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MATSUMOTO Mitsuhiro
Nara Prefectural Institute of Public Health
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Aki Y
Manufacturing Eng. Dev. Ctr. Msnc Sony Corporation
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IKUTA Nobuaki
Chiba Institute of Technology,Tsudanuma,
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Yokoyama Naoki
Department of Pediatrics, Kobe University Graduate School of Medicine
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TAKENAKA Hisataka
NTT Advanced Technology Corporation
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SAITO Yuri
Graduate School of Environmental and Information Sciences, Yokohama National University
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TAKAGI Shinichi
Kanagawa Industrial Technology Research Institute
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YOKOUCHI Masahiro
Kanagawa Industrial Technology Research Institute
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Kikuchi Yukiko
Toshiba Corporation R&d Center
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SASA Sigehiko
Fujitsu Laboratories Limited
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ANDO Hideyasu
Fujitsu Laboratories Ltd.
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MUROOKA Ken-ichi
Toshiba Corporation, R&D Center
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SUGHIARA Shinji
Toshiba Corporation, R&D Center
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MITSUI Soichiro
Toshiba Corporation, R&D Center
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NOMURA Hiroshi
Toshiba Corporation, R&D Center
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KONDO Kenzo
Toshiba Corporation, R&D Center
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SHINO Tomoaki
Toshiba Corporation, R&D Center
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KAWAGUCHIYA Hitomi
Toshiba Corporation, Microelectronics Engineering Laboratory
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SUNOUCHI Kazumasa
Toshiba Corporation, Microelectronics Engineering Laboratory
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DEGUCHI Kimiyoshi
Nippon Telegraph and Telephone Corporation, NTT LSI Laboratories
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MIYOSHI Kazunori
Nippon Telegraph and Telephone Corporation, NTT LSI Laboratories
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FUKUDA Makoto
Nippon Telegraph and Telephone Corporation, NTT LSI Laboratories
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HIGASHIKAWA Iwao
ULSI Research Laboratories, Toshiba Corporation
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Ishii Mutsuo
Department of Pediatrics, Nagoya Daini Red Cross Hospital
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KANEKO Hideo
Society of Non-Toraditional Technology (SNTT)
著作論文
- Effects of starting composition and carbon content on the formation of Ca-α SiAlON powders by carbothermal reduction–nitridation
- Highly Uniform Si-Doped GaAs Epitaxial Layers Grown by MBE Using a TEG, Arsenic, and Silicon System
- Substrate Temperature Dependence of Carbon Incorporation into GaAs Grown by MBE Using Triethylgallium and As_4
- Highly Uniform, High-Purity GaAs Epitaxial Layer Grown by MBE Using Triethylgallium and Arsenic : Semiconductors and Semiconductor Devices
- GaAs Surface Cleaning with HCl Gas and Hydrogen Mixture for Molecular-Beam-Epitaxial Growth : Semiconductors and Semiconductor Devices
- Effect of Thermal Etching on GaAs Substrate in Molecular Beam Epitaxy
- Threshold Behavior of a Bistable Ferroelectric Liquid Crystal with a Large Tilt Angle in Thick Cells (4-14μm) : Condensed matter
- New Room-Temperature Ferroelectric Liquid Crystals : Material Constants and Electro-Optic Properties
- Low-Frequency Waves in SF_6 Positive Columns Diluted with N_2 Gas
- Fracture Resistance and Contact Damage of TiN Particle Reinforced Si_3N_4 Ceramics(Properties (structural and functional),Guest Editors Dedicated to Prof. Gunter Petzow: Modern Trends in Advanced Ceramics)
- Spectroscopy of Hard X-Rays (2-15 keV) Generated by Focusing Femtosecond Laser on Metal Targets
- Tunneling Hot Electron Transistor Using GaAs/AlGaAs Heterojunctions
- Raman Scattering Studies of CuInS_2 Films Grown by RF Ion Plating
- Low-Temperature Deposition of CuIn(S_xSe_)_2 Thin Films by Ionized Cluster Beam Technique
- Growth and Characterization of CuInS_2 Films grown by Rf Ion-Plating
- Effect of H_2 on the Quality of Si-Doped Al_xGa_As Grown by MBE
- NMR study on the formation mechanism of β-SiAlON from zeolite by nitridation using ammonia gas
- Influence of MBE Growth Conditions on Persistent Photoconductivily Effects in N-AlGaAs and Selectively Doped GaAs/AlGaAs Heterostructures
- Evaluation of Replicated Dynamic Random Access Memory Cell Patterns using X-Ray Lithography
- Effects of Mask Line-and-Space Ratio in Replicating near-0.1-μm Patterns in X-Ray Lithography
- Analysis of Sub-0.15 μm Pattern Replication in Synchrotron Radiation Lithography
- MBE Growth of High-Quality GaAs Using Triethylgallium as a Gallium Source
- Selectively Doped GaAs/ N-Al_Ga_As Heterostructures Grown by Gas-Source MBE : Semiconductors and Semiconductor Devices
- Deep UV Mastering with a Write Compensation Technique Realizing over 20GB/layer Capacity Disc
- Correlation Between Bulk Orderings and Anchoring Structures of Liquid Crystals Studied by Scanning Tunneling Microscopy
- Two Types of Anchoring Structure in Smectic Liquid Crystal Molecules
- Picosecond Pulsed X-Ray Diffraction from a Pulsed Laser Heated Si(111)
- Time-Resolved X-ray Shadowgraphy Experiment of Laser Ablation of Aluminum using Laser-Induced Picosecond Pulsed X-rays
- Spall behavior of steels under hypervelocity impact
- Laser-Induced Shock Compression of Tantalum to 1.7 TPa
- Anchoring Structure of Binary Mixture of Liquid Crystals Studied by Scanning Tunneling Microscopy
- Ionization Coefficient in Gases under Nonuniform Electric Fields
- Deep UV Mastering Using an All-Solid-State 266 nm Laser for an over 20 GBytes/Layer Capacity Disk
- Si Atomic-Planar-Doping in GaAs Made by Molecular Beam Epitaxy
- A New Heterostructure for 2DEG System with a Si Atomic-Planar-Doped AlAs-GaAs-AlAs Quantum Well Structure Grown by MBE
- Picosecond Time-Resolved X-Ray Diffraction of a Photoexcited Silicon Crystal (Short Note)
- Shock-Induced Electromotive Force in Aqueous Solution of Potassium Fluoride
- Picosecond Time-Resolved X-Ray Diffraction from Si(111) under High-Power Laser Irradiation
- Modeling of the electron kinetics in proportional counters
- 衝撃圧縮法によるSm_2Fe_N_3焼結磁石の作製
- A Samarium-Iron Nitride Magnet Fabricated by Shock-Compaction Technique
- In-Situ Counting of Process-Induced Particles
- Drift Velocities of Electron Swarms in Methane : A Multi-Term Boltzmann Equation Analysis
- Particle Counting in Semiconductor Processing Gas and Apparatus with a New Flow-Cell-Type Laser Particle Counter
- Nitrogen Absorption by Sm_2Fe_(Guest Editors Dedicated to Prof. Gunter Petzow: Modern Trends in Advanced Ceramics)
- Sm_2Fe_-N系のP-C-T特性
- Sm_2Fe_中の窒素の拡散挙動
- Fabrication and wear properties of TiN nanoparticle-dispersed Si_3N_4 ceramics(SiAlons and Non-oxides)
- Influence of coarse particles on microstructure of aluminum nitride sintered body
- Synthesis of β-SiAlON from a zeolite by reduction nitridation in a mixture of NH_3-C_3H_8
- Effect of Oxygen Partial Pressure during Firing on Electrical Properties of Splintered Body Composed of Mn_CoNi_O_4 : Structure and Mechanical and Thermal Properties of Condensed Matter
- Preparation and Electrical Properties of Sintered Bodies Composed of Monophase Spinel Mn_Co_Ni_O_4 (0 ≦ X ≦ 1) Derived from Rock-Salt-Type Oxides
- Sm_2Fe_合金の水素吸収特性
- Effects of Preparation Parameters on EDLC Performance of the Chars from Phenol-resin Prepolymers Containing Ferrocene and Polyethylene Glycols : Part II : Effect of Amount of Polymer Blends
- Effects of Preparation Parameters on EDLC Performance of the Chars from Phenol-resin Prepolymers Containing Ferrocene and Polyethylene Glycols : Part I : Effects of the Molecular Weight of Polyethylene Glycol and the Carbonization Temperature
- Effects of Preparation Parameters on EDLC Performance of the Chars from Phenol-resin Prepolymers Containing Ferrocene and Polyethylene Glycols : Part III : Effect of Heating Rate