Hiyamizu Satoshi | Fujitsu Laboratories Limited
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概要
関連著者
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Hiyamizu Satoshi
Fujitsu Laboratories Limited
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Hiyamizu Satoshi
Fujitsu Limited
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HIYAMIZU Satoshi
Graduate School of Engineering Science, Osaka University
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Ishikawa T
Riken Harima Institute
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MUTO Shunichi
Fujitsu Laboratories Ltd.
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NANBU Kazuo
Fujitsu Laboratories Ltd.
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Nanbu Kazuo
Fujitsu Laboratories Limited
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Ishikawa T
National Space Dev. Agency Of Japan Ibaraki Jpn
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Fujii Toshio
Fujitsu Laboratories Lid.
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FUJII Toshio
Fujitsu Laboratories Ltd.
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ISHIKAWA Tomonori
Fujitsu Laboratories LTD.
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Muto S
Kek Ibaraki
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Ishikawa Tomonori
Fujitsu Laboratories Limited
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Ishikawa Takatoshi
Department Of Applied Physics Faculty Of Science Fukuoka University
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Sasa S
Fujitsu Laboratories Ltd.
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Sasa Shigehiko
Nanomaterials Microdevices Research Center Osaka Institute Of Technology
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SASA Shigehiko
Fujitsu Laboratories Ltd.
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Ishikawa Tomonori
Fujitsu Limited
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Hashimoto Hisao
Fujitsu Limited
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Saito J
Extreme Ultraviolet Lithography System Dev. Assoc. (euva) Kanagawa Jpn
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Saito Junji
Fujitsu Laboratories Limited
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Nanbu K
Fujitsu Laboratories Ltd.
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Nakata Yoshiaki
Fujitsu Laboratories Limited
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NAKATA Yoshiaki
Fujitsu Laboratories Ltd.
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INATA Tsuguo
Fujitsu Laboratories Ltd.
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Saito Junji
Fujitsu Laboratories Ltd.
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Komeya Katutoshi
Graduate School Of Environment And Information Science Yokohama National University
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Saito J
New Business Development Department Nikon Corporation In Hitachi Maxell
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Saito Jun
Nikon Corp. New Business Development Department
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MIMURA Takashi
Fujitsu Laboratories Lid.
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Kondo K
Fujitsu Laboratories Ltd.
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Nakata Y
Fujitsu Ltd. Atsugi Jpn
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Nishikawa Y
Toshiba Corp. Kawasaki Jpn
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KONDO Kazuhiro
Fujitsu Limited
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Kondo Kazuhiro
Fujitsu Laboratories Ltd.
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Hashimoto Hisao
Fujitsu Laboratories Limited
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SUGIYAMA Yoshihiro
Fujitsu Limited
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Sugiyama Y
Fujitsu Laboratories Ltd.
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Sugiyama Yoshinobu
Fujitsu Laboratories Ltd.
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Sugiyama Yoshihiro
Fujitsu Laboratories Ltd.
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Nishikawa Y
Materials And Devices Research Laboratories Toshiba Corporation
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ISHIKAWA Hideaki
Fujitsu Laboratories Ltd.
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Ishikawa T
Fujitsu Laboratories Ltd.
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YOKOYAMA Naoki
Fujitsu Laboratories Ltd.
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Takeyama Shojiro
Department Of Material Physics Faculty Of Engineering Science Osaka University
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NARITA Shin-ichiro
Department of Material Physics, Faculty of Engineering Science, Osaka University
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Nishi Hidetoshi
Fujitsu Limited
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LUO Wen
Department of Material Physics, Faculty of Engineering Science, Osaka University
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Ohnishi Hiroaki
Fujitsu Laboratories Ltd.
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HIKOSAKA Kohki
Fujitsu Laboratories Ltd.
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Nakata Yoshinori
Microgravity Materials Science Group Institute For Materials And Chemical Process National Institute
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Narita Shin-ichiro
Department Of Material Physics
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Narita Shin-ichiro
Department Of Material Physics Faculty Of Engineering Science Osaka University
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Nakata Y
Fujitsu Laboratories Ltd.
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Ohnishi H
Taihei Kogyo Co. Ltd. Himeji Jpn
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Luo Wen
Department Of Material Physics Faculty Of Engineering Science Osaka University
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Ohnishi Hiroaki
Division Of Hematology Faculty Of Medicine Kagawa University
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Nishi Hidetoshi
Fujitsu Laboratories Limited
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IMAMURA Kenichi
Fujitsu Laboratories Ltd.
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Imamura K
Fujitsu Lab. Ltd. Kanagawa Jpn
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Inoue Masataka
Department of Operative Dentistry, Osaka Dental University
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Sugiyama Y
Jst‐crest Ibaraki Jpn
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Inoue Masataka
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Hiyamizu Satoshi
Fujitsu Laboratories Ltd.
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Yokoyama Naoki
Department of Pediatrics, Kobe University Graduate School of Medicine
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SASA Sigehiko
Fujitsu Laboratories Limited
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Hikosaka K
Fujitsu Lab. Ltd. Kanagawa Jpn
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Matsui Toshiaki
Communications Research Laboratory Ministry Of Posts And Telecommunications
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Imamura Kimitake
Faculty Of Engineering Yokohama National University
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JOSHIN Kazukiyo
Fujitsu Laboratories Ltd.
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Mimura Takashi
National Institute Of Information And Communications Technology (nict)
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Matsui Toshiaki
National Institute Of Information And Communications Technology (nict)
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Endoh Akira
National Inst. Of Information And Communications Technol. (nict) Koganei‐shi Jpn
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OHSHIMA Toshio
Fujitsu Laboratories Ltd.
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Inata Tsuguo
Fujitsu Ltd.
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OSAMURA Kozo
Department of Metallurgy,Kyoto University
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KONDO Kazuo
Fujitsu Laboratories Ltd.
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SHIBATOMI Akihiro
Fujitsu Limited
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Wada Osamu
Fujitsu Laboratories Limited
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Wada Osamu
Fujitsu Laboratories
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OHSHIMA Takeshi
Japan Atomic Energy Research Institute
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Endoh A
Fujitsu Lab. Ltd. Atsugi Jpn
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Osamura Kozo
Department Of Metallurgy Kyoto University
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Muto Shunichi
Fujitsu Limited
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INUISHI Yoshio
Department of Electrical Engineering, Faculty of Engineering, Osaka University
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TATSUTA Shigeru
Fujitsu Ltd.
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OKAMURA Shigeru
Fujitsu Ltd.
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Yamashita Yoshimi
Fujitsu Laboratories Ltd.
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Hiyamizu S
Osaka Univ. Osaka Jpn
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Hiyamizu Satoshi
Fujitsu Ltd.
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MATSUSHIMA Wataru
Department of Metallurgy, Kyoto University
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HASHIM0T0 Hisao
Fujitsu Laboratories Ltd.
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HASHIMOTO Hisao
Department of Material Physics, Faculty of Engineering Science, Osaka University
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INADA Tsuguo
Fujitsu Laboratories Limited
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Sandhu Adarsh
Fujitsu Laboratories Limited
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KODAMA Kunihiko
Fujitsu Laboratories Limited
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ANDO Hideyasu
Fujitsu Laboratories Ltd.
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OSAMURA Kozo
Research Institute for Applied Sciences
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Yokoyama Naoki
Fujitsu Limited
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SHINOHARA Keisuke
Graduate School of Engineering Science, Osaka University
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YAMASHITA Yoshimi
Communications Research Laboratory
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ENDOH Akira
Communications Research Laboratory
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HIKOSAKA Kohki
Communications Research Laboratory
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MATSUI Toshiaki
Graduate School of Engineering Science, Osaka University
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MIMURA Takashi
Communications Research Laboratory
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Matsushima Wataru
Department Of Metallurgy Kyoto University
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Shibatomi Akihiro
Fujitsu Laboratories Limited
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Abe Masayuki
Fujitsu Laboratories Ltd.
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Abe Masayuki
Fujitsu Laboratories Limited
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Osamura K
Department Of Materials Science And Engineering Kyoto University
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Mimura Takashi
Fujitsu Laboratories Ltd.
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Inuishi Yoshio
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Ohshima T
Oki Electric Ind. Co. Ltd. Tokyo Jpn
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SUGAHARA Tomonobu
Fujitsu Laboratories Limited
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SAKURAI Teruo
Fujitsu Laboratories Limited
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Shibatomi A
Fujitsu Lab. Ltd. Atsugi Jpn
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Nishi H
Fujitsu Limited
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INAYAMA Minoru
Department of Electrical Engineering, Faculty of Engineering, Osaka University
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Inayama Minoru
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Tatsuta Shigeru
Fujitsu Laboratories Ltd.
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Okamura Shigeru
Fujitsu Laboratories Limited
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Shinohara K
National Institute Of Info. & Com. Tech.
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Kondo Kazuo
Fujitsu Laboratories Limited
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Osamura Kozo
Department Of Materials Science And Engineering Kyoto University
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Fujii Toshio
Fujitsu Limited
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HIKOSAKA Kohki
Fujitsu Lalboratories Ltd.
著作論文
- A New Functional, Resonant-Tunneling Hot Electron Transistor (RHET)
- Tunneling Hot Electron Transistor Using GaAs/AlGaAs Heterojunctions
- The Effects of Tungsten-Halogen Lamp Annealing on a Selectively Doped GaAs/N-AlGaAs Heterostructure Grown by MBE
- Structure Analysis of GaAs-AlAs Superlattice Grown by Molecular Beam Epitaxy
- Effect of H_2 on the Quality of Si-Doped Al_xGa_As Grown by MBE
- Reply to the Comment by H.L. Stormer
- The Effect of Annealing on the Electrical Properties of Selectively Doped GaAs/N-AlGaAs Heterojunction Structures Grown by MBE
- The Effect of Growth Temperature on the Mobility of Two-Dimensional Electron Gas in Selectively Doped GaAs/N-AlGaAs Heterostructures Grown by MBE
- Magnetoconductance Investigations of Al_xGa_As/GaAs Heterojunction FET in Strong Magnetic Fields
- Galvanomagnetic Study of 2-Dimensional Electron Gas in Al_xGa_As/GaAs Heterojunction FET
- Room-Temperature Mobility of Two-Dimensional Electron Gas in Selectively Doped GaAs/N-AlGaAs Heterojunction Structures
- Extremely High Mobility of Two-Dimensional Electron Gas in Selectively Doped GaAs/N-AlGaAs Heterojunction Structures Grown by MBE
- Electronic States in Selectively Si-Doped N-AlGaAs/GaAs/N-AlGaAs Single Quantum Well Structures Grown by MBE
- Improved 2DEG Mobility in Inverted GaAs/n-AlGaAs Heterostructures Grown by MBE
- Improved Electron Mobility Higher than 10^6 cm^2/Vs in Selectively Doped GaAs/N-AlGaAs Heterostructures Grown by MBE
- Implantation into an AlGaAs/GaAs Heterostructure : B-6: III-V DEVICE TECHNOLOGY
- Dependence of the Mobility and the Concentration of Two-Dimensional Electron Gas in Selectively Doped GaAs/N-Al_xGa_As Heterostructure on the AlAs Mole Fraction
- Electrical Properties of Si-Doped Al_xGa_As Layers Grown by MBE
- Influence of MBE Growth Conditions on Persistent Photoconductivily Effects in N-AlGaAs and Selectively Doped GaAs/AlGaAs Heterostructures
- Energy-Band Offset of In_Ga_As-In_(Ga_AI_x)_As Heterostructures, Determined by Photoluminescenee Excitation Spectroscopy of Quasi-Parabolie Quantum Wells Grown by MBE
- Quantum Well Width Dependence of Negative Differential Resistance of In_Al_As/In_Ga_As Resonant Tunneling Barriers Grown by MBE
- Extremely High 2DEG Concentration in Selectively Doped In_Ga_As/N-In_Al_As Heterostructures Grown by MBE
- Conduction Band Edge Discontinuity of In_Ga_As/In_(Ga_1 _xAl_x)_As(0≦x≦1) Heterostructures
- MBE Growth of InGaAlAs Lattice-Matched to InP by Pulsed Molecular Beam Method
- MBE Growth of High-Quality GaAs Using Triethylgallium as a Gallium Source
- Selectively Doped GaAs/ N-Al_Ga_As Heterostructures Grown by Gas-Source MBE : Semiconductors and Semiconductor Devices
- Extremely High-Speed Lattice-Matched InGaAs/InAlAs High Electron Mobility Transistors with 472 GHz Cutoff Frequency
- High Electron Mobility Transistor Logic
- Enhancement-Mode High Electron Mobility Transistors for Logic Applications
- A Pseudomorphic In_Ga_As/AlAs Resonant Tunneling Barrier with a Peak-to-Valley Current Ratio of 14 at Room Temperature
- Back-Gated Field Effect in a Double Two-Dimensional Electron Gas Structure
- Si Atomic-Planar-Doping in GaAs Made by Molecular Beam Epitaxy
- A New Heterostructure for 2DEG System with a Si Atomic-Planar-Doped AlAs-GaAs-AlAs Quantum Well Structure Grown by MBE
- Monolithic 1×4 Array of Uniform Radiance AlGaAs-GaAs LED's Grown by Molecular Beam Epitaxy
- Parallel Electron Transport and Field Effects of Electron Distributions in Selectively-Doped GaAs/n-AlGaAs
- Excellent Negative Differential Resistance of InAlAs/InGaAs Resonant Tunneling Barrier Structures Grown by MBE
- Effect of Silicon Doping Profile on I-V Characteristics of an AlGaAs/GaAs Resonant Tunneling Barrier Structure Grown by MBE
- InGaAlAs /InGaAs and InAlAs/InGaAlAs Quantum-Well Structures Grown by MBE Using Pulsed Molecular Beam Method
- A New Field-Effect Transistor with Selectively Doped GaAs/n-Al_xGa_As Heterojunctions